Zobrazeno 1 - 10
of 54
pro vyhledávání: '"Klaus Schierbaum"'
Autor:
Burak William Çetinkaya, Fabian Junge, Gregor Müller, Florian Haakmann, Klaus Schierbaum, Miroslaw Giza
Publikováno v:
Journal of Materials Research and Technology, Vol 9, Iss 6, Pp 16445-16458 (2020)
The surface chemistry of an exemplary hot-dip galvanized Zn–Al–Mg coating comprising 1.6 wt.% aluminum and 1.1 wt.% magnesium was characterized by means of secondary and transmission electron microscopy as well as synchrotron radiation X-ray phot
Externí odkaz:
https://doaj.org/article/e8c7c3a9abc540be8b89b17d1cf974b5
Publikováno v:
Sensors, Vol 23, Iss 1, p 29 (2022)
Oxidation reactions on semiconducting metal oxide (SMOs) surfaces have been extensively worked on in catalysis, fuel cells, and sensors. SMOs engage powerfully in energy-related applications such as batteries, supercapacitors, solid oxide fuel cells
Externí odkaz:
https://doaj.org/article/61032f817a1f468e8bab4902eacd3c4f
Autor:
Bernd Engelkamp, Klaus Schierbaum
Publikováno v:
Sensors, Vol 21, Iss 7, p 2558 (2021)
Here, we show that the presence of adsorbed water improves the oxygen-sensing properties of Pt/TiO2 at moderate temperatures. The studied interface is based on porous plasma electrolytic oxidized titanium (PEO-TiO2) covered with platinum clusters. Th
Externí odkaz:
https://doaj.org/article/0c8b225c9c554062a6e625dcaf56ad35
Publikováno v:
Sensors, Vol 19, Iss 21, p 4737 (2019)
The most promising and utilized chemical sensing materials, WO3 and SnO2 were characterized by means advanced synchrotron based XPS, UPS, NAP-XPS techniques. The complementary electrical resistance and sensor testing experiments were also completed.
Externí odkaz:
https://doaj.org/article/8249b73d294146cba60782b89f7dff96
Publikováno v:
Metals, Vol 8, Iss 6, p 386 (2018)
We report on plasma electrolytic oxidation of titanium, employing a technique with combined potentiostatic and galvanostatic control. The effect of different H 2 SO 4 electrolyte concentrations on the titanium oxide formation was studied sytematicall
Externí odkaz:
https://doaj.org/article/5a452a772b464d29995351de14a4338b
Autor:
Klaus Schierbaum, Anjana Devi, Jan-Lucas Wree, Aleksander Kostka, Andreas Ostendorf, Nils Boysen, David Zanders, Engin Ciftyurek, Maren Kasischke, Detlef Rogalla
Publikováno v:
Dalton Transactions. 49:13462-13474
Molybdenum disulfide (MoS2) is known for its versatile properties and hence is promising for a wide range of applications. The fabrication of high quality MoS2 either as homogeneous films or as two-dimensional layers on large areas is thus the object
Autor:
Martin Wilken, Engin Ciftyürek, Stefan Cwik, Lukas Mai, Bert Mallick, Detlef Rogalla, Klaus Schierbaum, Anjana Devi
Publikováno v:
Small. 19:2204636
The intrinsic properties of semiconducting oxides having nanostructured morphology are highly appealing for gas sensing. In this study, the fabrication of nanostructured WO
Autor:
Zhongshan Li, Yujiao Li, Klaus Schierbaum, Michael Wark, Alfred Ludwig, Dennis Zywitzki, Daniel M. Baier, Dereje H. Taffa, Jan-Lucas Wree, Raoul Schaper, Detlef Rogalla, Anjana Devi, Engin Ciftyurek, Michael Meischein
Publikováno v:
Zywitzki, D, Schaper, R, Ciftyürek, E, Wree, J L, Taffa, D H, Baier, D M, Rogalla, D, Li, Y, Meischein, M, Ludwig, A, Li, Z, Schierbaum, K, Wark, M & Devi, A 2021, ' Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films : Investigation of Structure and Pseudocapacitive Properties ', Advanced Materials Interfaces, vol. 8, no. 20, 2100949 . https://doi.org/10.1002/admi.202100949
Transition metal ferrites, such as CoFe2O4 (CFO) and NiFe2O4 (NFO), have gained increasing attention as potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages like interface quality to the underlying substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2172adf953d76dad705dc5a9e8affa5
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf
Autor:
Detlef Rogalla, Anjana Devi, Aleksander Kostka, Ersoy Subaşı, David Zanders, Niklas Huster, Claudia Bock, Engin Ciftyurek, Klaus Schierbaum
Publikováno v:
ACS Applied Materials & Interfaces. 11:28407-28422
A bottom-up approach starting with the development of new Hf precursors for plasma-enhanced atomic layer deposition (PEALD) processes for HfO2 followed by in situ thin-film surface characterization...
Autor:
Claudia Bock, Guido Grundmeier, Teresa de los Arcos, Christian Hoppe, Klaus Schierbaum, Ersoy Subaşı, Anjana Devi, Lukas Mai, Detlef Rogalla, Engin Ciftyurek, David Zanders, Wolfram Gilbert
Publikováno v:
ACS Applied Materials & Interfaces. 11:3169-3180
A bottom-up process from precursor development for tin to plasma-enhanced atomic layer deposition (PEALD) for tin(IV) oxide and its successful implementation in a working thin-film transistor devic...