Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Kiyohito Ito"'
Autor:
Makoto Muramatsu, Takanori Nishi, Kiyohito Ito, Yoshihito Takahashi, Yasunori Hatamura, Takahiro Kitano, Tomohiro Iwaki
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1af227f0f129d5f7c2cf2c429b8fd24
https://doi.org/10.1117/12.2658245
https://doi.org/10.1117/12.2658245
Autor:
Soichiro Okada, Shota Yoshimura, Shinji Kobayashi, Satoru Shimura, Shinya Morikita, Kiyohito Ito, Masashi Enomoto
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Multi-patterning, like LE and SAMP, has been in production for several years. It is expected to remain a standard in patterning, even in the case where industry adopts EUV photo lithography. As scaling continues, the precision of pattern placement re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc22ded3ca89110d88a4c42e0303b7a0
https://doi.org/10.1117/12.2514663
https://doi.org/10.1117/12.2514663
Autor:
Stijn Schoofs, Mu Feng, Kyohei Koike, Kumar Kaushik, Hidetami Yaegashi, Fumiko Yamashita, Vadim Timoshkov, Shota Yoshimura, Mark John Maslow, Liesbeth Reijnen, Shinya Morikita, Chris Spence, Kiyohito Ito, Carlos Fonseca, Peter Choi, Tae Kwon Jee
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Extreme UV(EUV) technology must be potential solution for sustainable scaling, and its adoption in high volume manufacturing(HVM) is getting realistic more and more. This technology has a wide capability to mitigate various technical problem in Multi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34bba6132b6143c005f833cbf4f27006
https://doi.org/10.1117/12.2297661
https://doi.org/10.1117/12.2297661
Autor:
Saito Yusuke, Takahiro Kitano, Shinya Morikita, Noriaki Oikawa, Takanori Nishi, Gen You, Kiyohito Ito, Toshikatsu Tobana, Makoto Muramatsu, Yasuyuki Ido
Publikováno v:
SPIE Proceedings.
Directed self-assembly (DSA) has been investigated over the past few years as the candidate for next generation lithography. Especially, sub 20nm line and space patterns obtained by chemo-epitaxy process are expected to apply to DRAM active area, Log
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38cd0d93660e161854b9aaafac17e224
https://doi.org/10.1117/12.2257952
https://doi.org/10.1117/12.2257952
Autor:
Mark Somervell, Toshikatsu Tobana, Takahiro Kitano, Takanori Nishi, Kiyohito Ito, Makoto Muramatsu, Yasuyuki Ido, Satoru Nakamura, Gen You, Weichien Chen, Saito Yusuke, Masanori Hosoya
Publikováno v:
SPIE Proceedings.
Directed self-assembly (DSA) is one of the candidates for next generation lithography. Over the past few years, cylindrical and lamellar structures dictated by the block co-polymer (BCP) composition have been investigated for use in patterning contac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a823a6f9fc0a9c3882863a82bd84553
https://doi.org/10.1117/12.2218595
https://doi.org/10.1117/12.2218595
Autor:
Sanjana Das, Elliott Franke, Angelique Raley, Mingmei Wang, Kiyohito Ito, Nihar Mohanty, Eric Liu, Kenjiro Nawa, Devillers Anton J, Richard A. Farrell, Akiteru Ko, Peter Biolsi, David L. O'Meara, Jeffrey S. Smith, Steven Scheer, Alok Ranjan, Kaushik A. Kumar
Publikováno v:
SPIE Proceedings.
Patterning the desired narrow pitch at 10nm technology node and beyond, necessitates employment of either extreme ultra violet (EUV) lithography or multi-patterning solutions based on 193nm-immersion lithography. With enormous challenges being faced
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d361fb6573cc7d2ce9a7d1db705e1451
https://doi.org/10.1117/12.2085016
https://doi.org/10.1117/12.2085016
Autor:
Hidetami Yaegashi, Kyohei Koike, Fonseca, Carlos, Fumiko Yamashita, Kaushik, Kumar, Shinya Morikita, Kiyohito Ito, Shota Yoshimura, Timoshkov, Vadim, Maslow, Mark, Tae Kwon Jee, Reijnen, Liesbeth, Choi, Peter, Mu Feng, Spence, Chris, Schoofs, Stijn
Publikováno v:
Proceedings of SPIE; 1/14/2018, Vol. 10586, p1-5, 5p
Publikováno v:
Heteroatom Chemistry. 16:111-120
5,6-Bis(methylthio)-4,7-diethylbenzo-[1,2,3]-trithiole [MBT] was oxidized with two equivalents of SbCl5 to produce a dication, MBT(2+)ċ2SbCl, as a stable, dark-brown solid. MBT(2+) was unexpectedly silent for 1H-NMR in CD3CN, whereas it was active f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8311941b468e0805917a31de8fb30e96
https://doi.org/10.1002/hc.20078
https://doi.org/10.1002/hc.20078