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of 7
pro vyhledávání: '"Kirk Murray"'
Autor:
Kirk Murray
Newcomers to Iowa are always amazed at the yearly changes in the heights of fields. The landscape expands from ground level to ten feet tall and back again every year: from frozen bare ground in winter to light green sprouts in late spring to dark gr
Autor:
Gregory Kirk Murray
Publikováno v:
continent., Vol 1, Iss 2, Pp 145-147 (2011)
A creative review of Agamben's new book of essays separated into "clothing," which contains commentary on the essays, and "the body," which contains quotes from the essays themselves. it pressures the idea of the "book review" and opens spaces for fu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doajarticles::cbd95f69d0d66bdd92e96539ae19adf8
http://www.continentcontinent.cc/index.php/continent/article/viewArticle/19
http://www.continentcontinent.cc/index.php/continent/article/viewArticle/19
Autor:
Shy-Jay Lin, Luca Grella, T. P. Wang, William M. Tong, Jaw-Jung Shin, Mark A. McCord, Paul Petric, Allen Carroll, Wen-Chuan Wang, Kirk Murray, Tsung-Hsin Yu, Christopher F. Bevis, Tze-Chiang Huang
Publikováno v:
SPIE Proceedings.
Reflective electron-beam lithography (REBL) employs a novel device to impress pattern information on an electron beam. This device, the digital pattern generator (DPG), is an array of small electron reflectors, in which the reflectance of each mirror
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f29216a9d23d5afd41103ff304cd190
https://doi.org/10.1117/12.2048528
https://doi.org/10.1117/12.2048528
Autor:
Kirk Murray, Anil U. Mane, Mark A. McCord, Jeffrey W. Elam, Shinichi Kojima, Paul Petric, Thomas Gubiotti, William M. Tong, Bart Vereecke, Alan D. Brodie, Christopher F. Bevis, Luca Grella, Francoise Kidwingira, Allen Carroll, Fuge Sun, Luc Haspeslagh
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:031107
The digital pattern generator (DPG) is a complex electron-optical MEMS that pixelates the electron beam in the reflective electron beam lithography (REBL) e-beam column. It potentially enables massively parallel printing, which could make REBL compet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9715a8160d751798e17f5a2fe0ec127
https://doi.org/10.1117/1.jmm.12.3.031107
https://doi.org/10.1117/1.jmm.12.3.031107
Publikováno v:
Lab on a Chip; Mar2005, Vol. 5 Issue 4, p374-377, 4p
Autor:
Morrison, Kirk Murray
This thesis assesses the potential for enhanced biological phosphorus (Bio-P) removal in Canadian wastewater treatment plants. Retrofit designs incorporating Bio-P removal were prepared for nine wastewater treatment plants across Canada, and were com
Externí odkaz:
http://hdl.handle.net/2429/28507