Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Kirk Boyer"'
Publikováno v:
Discrete Applied Mathematics. 332:87-100
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfe08c19d30d73e3f1afacda95d5569b
https://doi.org/10.1016/j.dam.2023.01.005
https://doi.org/10.1016/j.dam.2023.01.005
Publikováno v:
Discrete Applied Mathematics. 225:11-21
Wireless sensor networks are commonly used to monitor various environmental conditions. Possible geometries for the region covered by a sensor include disks, wedges, and rays, among others, depending on the function of the sensor. In this paper we co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d9fecd0009a72e62f6dfd3fda4f1d059
https://doi.org/10.1016/j.dam.2017.03.002
https://doi.org/10.1016/j.dam.2017.03.002
Autor:
Boris Brimkov, Rachel Kirsch, Michael Phillips, Ariel Keller, Kirk Boyer, Carolyn Reinhart, Daniela Ferrero, Sean English
Zero forcing is an iterative graph coloring process, where given a set of initially colored vertices, a colored vertex with a single uncolored neighbor causes that neighbor to become colored. A zero forcing set is a set of initially colored vertices
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::45a9a3c13cabcfe3e40b82a8c545022b
http://arxiv.org/abs/1801.08910
http://arxiv.org/abs/1801.08910
Publikováno v:
Information Systems Security ISBN: 9783030051709
ICISS
ICISS
Modern technology allows for the detection and identification of a vehicle passing through specific locations on a road network. The most prominent technology in use leverages cameras capable of high speed image capture, back-end extraction of plate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f10a77d98ddd5e148697336e24e7e3ac
https://doi.org/10.1007/978-3-030-05171-6_1
https://doi.org/10.1007/978-3-030-05171-6_1
Publikováno v:
MRS Proceedings. 98
A large area (2.8 cm2) electron beam source has been developed, characterized, and applied to anisotropic etching of SiO2 masked with photoresist. This beam operates at high pressures (up to 100 mTorr), in reactive gases, and at more than 10 mA/cm2.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::abb304e8d2c1eb206a3f40ee9931e2d2
https://doi.org/10.1557/proc-98-223
https://doi.org/10.1557/proc-98-223
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