Structure of TiAlN reactive sputtered coatings

Autor: Denisov, V.N., Mavrin, B.B., Vinogradov, E.A., Polyakov, S.N., Kiricjenko, A.N., Gogolinsky, K.V., Useinov, A.S., Blank, V.D., Godinho, V., Fernández-Camacho, A.

Publikováno v: Digital.CSIC. Repositorio Institucional del CSIC
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Journal of Nano and Electronic Physics
Journal of Nano and Electronic Physics, Sumy State University (Sumy, Ukraine), 2012, 4 (1), pp.01021

The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::63179b07bf9aaf5045d285f2974c39d3
http://hdl.handle.net/10261/98004