X-ray mask repair with focused ion beams.

Autor: Wagner, A., Levin, J. P., Mauer, J. L., Blauner, P. G., Kirch, S. J., Longo, P.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1557-1564, 8p

Importance of adsorption in ion beam induced deposition of carbon.

Autor: Kirch, S. J., Seeger, D. E.

Publikováno v: Applied Physics Letters; 7/2/1990, Vol. 57 Issue 1, p49, 3p