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Study on plasma characteristics and gas analysis before and after recovery using liquid-fluorocarbon precursor

Autor: Park, Junyoung, Oh, Byoungmoon, Kim, Kyongnam, Sung, Dain, Yeom, Geunyoung

Publikováno v: In Applied Surface Science 1 December 2020 532

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Clean SiO 2 atomic layer etching based on physisorption of high boiling point perfluorocarbon.

Autor: Sung D; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea. mintcheek@gmail.com., Tak H; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea. mintcheek@gmail.com., Kim H; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea. mintcheek@gmail.com., Kim D; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea. mintcheek@gmail.com., Kim K; School of Advanced Materials Engineering, Daejeon University, Daejeon 34520, Republic of Korea. knam1004@gmail.com., Yeom G; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea. mintcheek@gmail.com.; SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon 16419, Republic of Korea. gyyeom@skku.edu.

Publikováno v: Nanoscale [Nanoscale] 2024 Aug 07; Vol. 16 (30), pp. 14433-14440. Date of Electronic Publication: 2024 Aug 07.