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pro vyhledávání: '"Kijima Takahiko"'
Publikováno v:
Journal of The Electrochemical Society. 145:3560-3569
Highly purified SiH 4 gas is required for manufacturing silicon semiconductor devices (e.g., the formation of Si-single crystal, poly-Si, Si 3 N 4 , and siliside thin films. We have newly established a technology for delicately measuring impurities i