Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Kiers, Ton"'
Autor:
Sanchez, Martha, Ukraintsev, Vladimir, Lakcher, Amine, Le-Gratiet, Bertrand, Ducote, Julien, Fanton, Pierre, Kiers, Ton, Gemmink, Jan-Willem, Hunsche, Stefan, Prentice, Christopher, Besacier, Maxime
Publikováno v:
SPIE Advanced Lithography
SPIE Advanced Lithography, 2017, San Jose, United States. ⟨10.1117/12.2257876⟩
SPIE Advanced Lithography, 2017, San Jose, United States. ⟨10.1117/12.2257876⟩
Today’s CD-SEM metrology is challenged when it comes to measuring complex features found in patterning hotspots (like tip to tip, tip to side, necking and bridging). Metrology analysis tools allow us to extract SEM contours of a feature and convert
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca2196813f1f25b1059025b854b8351f
https://doi.org/10.1117/12.2257876
https://doi.org/10.1117/12.2257876
Autor:
Felix, Nelson M., Lio, Anna, Lyons, Adam, Long, Luke, Wallow, Tom, Spence, Chris, Kiers, Ton, van Adrichem, Paul, Vaenkatesan, Vidya, Fu, Jiyou, Hennerkes, Christoph, Tabery, Cyrus
Publikováno v:
Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116090C-116090C-12, 11492923p
Autor:
Maslow, Mark John, Timoshkov, Vadim, Kiers, Ton, Tae Kwon Jee, Reijnen, Liesbeth, Kumar, Kaushik, Demand, Marc, Fonseca, Carlos, Cerbu, Florin, Schelcher, Guillaume, Beral, Christophe
Publikováno v:
Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-14, 14p
Autor:
Engelmann, Sebastian U., Wise, Rich S., Maslow, Mark J., Timoshkov, Vadim, Kiers, Ton, Jee, Tae Kwon, de Loijer, Peter, Morikita, Shinya, Demand, Marc, Metz, Andrew W., Okada, Soichiro, Kumar, Kaushik A., Biesemans, Serge, Yaegashi, Hidetami, Di Lorenzo, Paolo, Bekaert, Joost P., Mao, Ming, Beral, Christophe, Larivière, Stephane
Publikováno v:
Proceedings of SPIE; April 2017, Vol. 10149 Issue: 1 p101490N-101490N-16, 10047527p
Autor:
Panning, Eric M., Goldberg, Kenneth A., Bekaert, Joost, Di Lorenzo, Paolo, Mao, Ming, Decoster, Stefan, Larivière, Stéphane, Franke, Joern-Holger, Blanco Carballo, Victor M., Kutrzeba Kotowska, Bogumila, Lazzarino, Frederic, Gallagher, Emily, Hendrickx, Eric, Leray, Philippe, Kim, R. Ryoung-han, McIntyre, Greg, Colsters, Paul, Wittebrood, Friso, van Dijk, Joep, Maslow, Mark, Timoshkov, Vadim, Kiers, Ton
Publikováno v:
Proceedings of SPIE; April 2017, Vol. 10143 Issue: 1 p101430H-101430H-15, 10041586p
Autor:
Cramer, Hugo1 hugo.cramer@asml.com, Kiers, Ton1, Vanoppen, Peter1, Meessen, Jeroen1, Blok, Frank1, Dusa, Mircea2, Kremer, Stephanie3
Publikováno v:
Solid State Technology. Dec2004, Vol. 47 Issue 12, p36-42. 5p.
Scatterometry based 65nm node CDU analysis and prediction using novel reticle measurement technique.
Publikováno v:
Proceedings of SPIE; Nov2005, Issue 1, p1312-1322, 11p
Publikováno v:
Proceedings of SPIE; Nov2005, Issue 1, p30-40, 11p
Publikováno v:
Proceedings of SPIE; Nov2004, Issue 1, p1254-1264, 11p
Publikováno v:
Proceedings of SPIE; Nov2002, Issue 1, p1110-1121, 12p