Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kien Mun Lau"'
Publikováno v:
SPIE Proceedings.
High resolution electron beam lithography poses severe constraints on any suitable resist, namely the need to work with very thin layers in order to achieve highest resolutions, while at the same time possessing suitable resistance to plasma etching.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cbaf9db7da7dd3be4ae81e62177f7f4
https://doi.org/10.1117/12.656823
https://doi.org/10.1117/12.656823
Autor:
Jacques Beauvais, Kien Mun Lau, Teodor Veres, Andrew Zanzal, Bo Cui, Eric Lavallee, Dominique Drouin
Publikováno v:
SPIE Proceedings.
Nano-Imprint lithography has garnered much interest in the microlithography and nano-fabrication communities, and appears on the ITRS as a possible future lithography solution. The promise of this approach includes realization of ultimately finer fea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f95581fe7d0399eb693903f0d9919c64
https://doi.org/10.1117/12.599795
https://doi.org/10.1117/12.599795
Autor:
Cloutier, Melanie, Awad, Yousef, Lavallee, Eric, Turcotte, David, Beauvais, Jacques, Drouin, Dominique, Kien Mun, Lau, Yang, Pan, Lafrance, Pierre, Legario, Ron, Yoshida, Akira, Nozue, Hiroshi
Publikováno v:
Proceedings of SPIE; Nov2004, Issue 1, p521-528, 8p
Autor:
Prasad Kelkar, Kien Mun Lau, Melanie Cloutier, Jacques Beauvais, Eric Lavallee, Pan Yang, Yousef Awad, Dominique Drouin, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1040
A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask formed by nickel pulse reversal plating to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2d1f7703316028c24c59386990d4364
https://doi.org/10.1116/1.1647589
https://doi.org/10.1116/1.1647589