Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Khatia Benotmane"'
Autor:
Maxime Argoud, Anaïs De Lehelle D'Affroux, Martin Eibelhuber, Khatia Benotmane, Sebastian Haumann, Jérôme Reche, Jonas Khan
Publikováno v:
Novel Patterning Technologies 2021.
The NanoImprint Lithography (NIL) technology by using a soft stamp is today ready for high volume manufacturing (HVM) with the global solution proposed by EVG1. This UV-based imprint, using a transparent stamp is now a standard technology and the mos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8ddf05fa13d10be3ef59503964102b6
https://doi.org/10.1117/12.2583631
https://doi.org/10.1117/12.2583631
Autor:
Christophe Navarro, Nicolas Posseme, Maxime Argoud, Maria Gabriela Gusmão Cacho, Charlotte Bouet, Patricia Pimenta-Barros, Khatia Benotmane, Raluca Tiron, Guido Rademaker
Publikováno v:
Journal of Vacuum Science & Technology B
Directed self-assembly (DSA) of block copolymers (BCPs) is an advanced patterning technique being investigated to obtain small and dense patterns for future technological nodes. In order to demonstrate the potential of DSA to extend optical lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b592f435bb071ae63ed2910e550cceba
Autor:
Maxime Argoud, A. Le Pennec, Tommaso Jacopo Giammaria, Xavier Chevalier, Guido Rademaker, Raluca Tiron, Christophe Navarro, Ahmed Gharbi, M.-L. Pourteau, Kaumba Sakavuyi, Charlotte Bouet, Paul F. Nealey, M. G. Gusmao Cacho, Khatia Benotmane, H. Pham, C. Nicolet, A. Paquet
Publikováno v:
Advances in Patterning Materials and Processes XXXVII
Directed Self-Assembly (DSA) of Block Copolymers (BCP) by chemo-epitaxial alignment is a promising high resolution lithography technique compatible with CMOS high-volume manufacturing. It allows overcoming limitations in resolution and local stochast
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::04bba6add8361b70f98da428326e8d11
https://doi.org/10.1117/12.2552003
https://doi.org/10.1117/12.2552003
Autor:
Nicolas Posseme, Charlotte Bouet, Patricia Pimenta-Barros, Aurélie Le Pennec, Maxime Argoud, Raluca Tiron, Guido Rademaker, Khatia Benotmane, Maria Gabriela Gusmão Cacho
Publikováno v:
Journal of Vacuum Science and Technology A
Directed self-assembly (DSA) of block copolymers is one of the most promising solutions investigated to obtain small and dense patterns for the sub-10 nm nodes. One of the most important aspects of the DSA technology is the orientation control of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fefc8b27b35f73a7676748326c444ee8
Autor:
Gusmao Cacho, Maria
Publikováno v:
Micro and nanotechnologies/Microelectronics. Université Grenoble Alpes [2020-..], 2021. English. ⟨NNT : 2021GRALT056⟩
For the sub-10 nm technologic nodes, conventional lithography has achieved its limit in terms of pattern scaling and new patterning techniques are being studied to continue the miniaturization of the transistor’s dimensions. In this PhD, we have fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::d15cc5d9d09c32a5632fbf34bdb6530e
https://theses.hal.science/tel-03524057
https://theses.hal.science/tel-03524057
