Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Khalid Dhima"'
Publikováno v:
Applied Physics A. 121:405-414
With nanoimprint, instabilities of the polymeric layer between the substrate and the stamp are observed when incomplete filling of the stamp cavities prevails, resulting in capillary bridges and meandering structures. Experiments show that instabilit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c854627693a771e56542d535a9af0f08
https://doi.org/10.1007/s00339-015-9300-3
https://doi.org/10.1007/s00339-015-9300-3
Publikováno v:
Applied Physics A. 121:481-487
Low-pressure imprint is interesting to avoid stamp deformation, stamp failure as well as polymer recovery. When large-area stamps are prepared with a stepping procedure, low pressure is required to optimize the stitching. However, with low-pressure i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e827c34629198e4a168a2b97b522b880
https://doi.org/10.1007/s00339-015-9301-2
https://doi.org/10.1007/s00339-015-9301-2
Publikováno v:
Microelectronic Engineering. 141:92-101
Display Omitted 'Residual layer free imprint' by use of exposure on reflecting substrates.'Residual layer lithography' by use of interference effects to define patterns of about 50nm.'Hybrid lithography' to overcome pattern size limitations of T-NIL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07bdd68b2b38ab2ccdef27b65cc8c1cf
https://doi.org/10.1016/j.mee.2015.01.039
https://doi.org/10.1016/j.mee.2015.01.039
Autor:
Marc Papenheim, Khalid Dhima, Anke Helfer, Hella-Christin Scheer, Patrick Görrn, Andreas Polywka, Christian Steinberg, Si Wang
Publikováno v:
Applied Physics A. 121:357-362
The morphology of highly regular, semi-crystalline P3HT (poly 3-hexylthiophene-2.5-diyl) after thermal nanoimprint is studied and compared to that of its amorphous counterpart. Differential scanning calorimetry measurements of both materials provide
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b45df7de67f0c34a65fd74c46e6c1176
https://doi.org/10.1007/s00339-015-9204-2
https://doi.org/10.1007/s00339-015-9204-2
Publikováno v:
Microsystem Technologies. 21:1595-1605
The role of capillary forces with nanoimprint is addressed. As the respective capillaries are the closed cavities of the stamp used for replication, the Laplace pressure together with the pressure of the gas phase inside the cavities dictate the equi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3912b1f143ebcf220e9543a09e31718
https://doi.org/10.1007/s00542-014-2376-4
https://doi.org/10.1007/s00542-014-2376-4
Autor:
Si Wang, Christian Steinberg, Andre Mayer, Hella-Christin Scheer, Khalid Dhima, Marc Papenheim
Publikováno v:
Microelectronic Engineering. 123:84-88
Graphical abstractDisplay Omitted Combination of nanoimprint lithography of negative tone resist with a UV-flood exposure.Pattern definition in the remaining residual layer.Use of interference and diffraction effects along the imprinted edges to defi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6931bda9bf94f59afb18cdbe0b42c48c
https://doi.org/10.1016/j.mee.2014.05.008
https://doi.org/10.1016/j.mee.2014.05.008
Autor:
Klaus Zimmer, Andre Mayer, Marc Papenheim, Si Wang, Hella-Christin Scheer, Khalid Dhima, Christian Steinberg, Daniel Blenskens, Joachim Zajadacz
Publikováno v:
Microelectronic Engineering. 123:4-8
Controlled deposition of anti-sticking layers based on the use of evaporation cell.Tuning of process time and uniformity by multiple-cell arrangement.Uniformity of surface energy better than ?4% over 100mm diameter.Low surface energy (?10-15mN/m) obt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::506dbcbda59807383522ad6ad861d2b0
https://doi.org/10.1016/j.mee.2014.04.002
https://doi.org/10.1016/j.mee.2014.04.002
Autor:
Si Wang, Felix Schröter, Christian Steinberg, Hella-Christin Scheer, Marc Papenheim, Andre Mayer, Khalid Dhima
Publikováno v:
Microelectronic Engineering. 123:100-104
Display Omitted 5µm high polymeric bridges induced by a temperature difference.Silica particles as spacers between stamp and substrate.Rough estimation of mechanical properties of silica particles. Instability-induced pattern formation is easily rea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::365bb6a5da4ec25bfd3e86161d462c00
https://doi.org/10.1016/j.mee.2014.05.010
https://doi.org/10.1016/j.mee.2014.05.010
Autor:
Christian Steinberg, Andre Mayer, Hella-Christin Scheer, Khalid Dhima, Si Wang, Marc Papenheim
Publikováno v:
Microelectronic Engineering. 123:43-47
Graphical abstractDisplay Omitted A semi-analytical approach in a matrix form to handle the intensity distribution within photoresist layers.Thermal nanoimprint with well-defined residual layer (dR≤30nm) and without physical self-assembly defects.R
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bafc1b67ae6b50a15ae3283f86299a36
https://doi.org/10.1016/j.mee.2014.05.017
https://doi.org/10.1016/j.mee.2014.05.017
Publikováno v:
Microsystem Technologies. 20:1891-1898
When nanoimprint is not used for lithography purposes (NIL), but for the direct patterning of polymeric layers, high aspect ratio patterns may be of interest for a number of applications. The definition of such patterns in a nanoimprint process deals
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2042e70379c75d48bcc73141b67e4eb3
https://doi.org/10.1007/s00542-013-1968-8
https://doi.org/10.1007/s00542-013-1968-8