Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Khaled M. Soradi"'
Autor:
Khaled M. Soradi, Nevin M. Darwish
Publikováno v:
Journal of Electrical Systems and Information Technology, Vol 3, Iss 2, Pp 210-216 (2016)
Double patterning photolithography (DPL) is considered one of the best solutions used for enabling 32 nm/22 nm technology. In this paper, we propose a new technique for double patterning post decomposition conflict resolution. The algorithm is based
Externí odkaz:
https://doaj.org/article/938ff82c76fb41e1b4af9d6fa52d7518
Autor:
Nevin M. Darwish, Khaled M. Soradi
Publikováno v:
Journal of Electrical Systems and Information Technology, Vol 3, Iss 2, Pp 210-216 (2016)
Double patterning photolithography (DPL) is considered one of the best solutions used for enabling 32 nm/22 nm technology. In this paper, we propose a new technique for double patterning post decomposition conflict resolution. The algorithm is based
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1b0bac45678e07d7f15c738451dd0df2
https://doi.org/10.1016/j.jesit.2015.08.004
https://doi.org/10.1016/j.jesit.2015.08.004