Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Kevin W. Collins"'
Autor:
Ravi K. Bonam, Masayuki Kagawa, Takeshi Isogawa, Kevin W. Collins, Mark Lawliss, Lin Cheong, Jed H. Rankin, Eisuke Narita, Richard Poro, Luke Bolton, Louis Kindt, Christina Turley
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
The backside of photomasks have been largely ignored during the last several decades of development, with the exception of avoiding gross damage or defects, as almost all problems are far enough out of the focal plane to have minimal effect on imagin
Autor:
Michael J. Trybendis, Christopher Magg, Kevin W. Collins, Michael J. Lercel, Monica Barrett, Kenneth C. Racette, Lucien Bouchard, Mark Lawliss
Publikováno v:
SPIE Proceedings.
Masks for next generation lithographies present difficult technical processing, challenges for meeting the demanding requirements of future lithography. The Next Generation Lithography Mask Center of Competency is applying the proximity x-ray mask te
Autor:
Kevin W. Collins, Monica Barrett, Kenneth C. Racette, Steven C. Nash, Christopher Magg, Michael J. Trybendis, Neal Caldwell, Lucien Bouchard, Mark Lawliss, Cameron J. Brooks, Michael J. Lercel, Raymond Walter Jeffer
Publikováno v:
SPIE Proceedings.
Mask fabrication is one of the difficult challenges with all Next Generation Lithography (NGL) technologies. X-ray, e-beam projection, and ion-beam projection lithography all use some form of membrane mask, and extreme ultraviolet (EUV) lithography u
Autor:
Charles A. Whiting, Jeff D. Towne, Kevin W. Collins, James A. Warner, Danny M. Plouff, Kurt R. Kimmel, Douglas E. Benoit, Susan Sonchik Marine, Jeffrey P. Lissor, Harold G. Linde
Publikováno v:
SPIE Proceedings.
This paper describes the evolution of a simple recirculating etch station into a successful x-ray mask membrane-etch station. The manufacturing etch station consists of a large, heated mix tank in which she ethanolamine solution is brought to reactio
Autor:
Gregory R. Bogart, Myrtle I. Blakey, David P. Mancini, D. J. Resnick, K. H. Smith, S.-I. Han, Michael J. Lercel, William J. Dauksher, James Alexander Liddle, Leonidas E. Ocola, Michael J. Trybendis, Richard J. Kasica, C. G. Caminos, Chris Magg, Kevin W. Collins, Anthony E. Novembre, Chester S. Knurek, Pawitter J. S. Mangat, Zorian S. Masnyj, R. Jeffer, Milton L. Peabody, K. Teffeau, Reginald C. Farrow, L. Rutberg, N. Cadwell, R. F. Fullowan
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:2659
Methods for correcting pattern placement errors found on SCALPEL™ masks are addressed. The methodology and implementation of individual membrane image placement correction is presented, showing its advantages over the global image placement correct
Autor:
Chris Magg, Ray Jeffer, Neal Caldwell, Michael J. Trybendis, Monica Barrett, Michael J. Lercel, Kevin W. Collins, Lucien Bouchard
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3210
Masks for electron projection lithography (EPL) require the use of thin membranes for either stencil or all membrane scattering masks. The processes of forming the printable patterns before or after the membrane etch step are compared for EPL stencil
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