Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Kevin Matsui"'
Autor:
Kevin Matsui, Takeshi Tawara, Shinsuke Harada, So Tanaka, Hiroshi Sato, Hiroshi Yano, Noriyuki Iwamuro
Publikováno v:
IEEJ Transactions on Electrical and Electronic Engineering. 18:278-285
Publikováno v:
IEEE Electron Device Letters. 41:1810-1813
In this letter, the authors demonstrated superior electrical characteristics of a 1.2 kV SiC Schottky barrier diode-wall integrated trench MOSFET (SWITCH-MOS) with the higher Schottky barrier height of nickel. It was confirmed that a significant impr
Autor:
Shinsuke Harada, Shunki Todaka, Kevin Matsui, Noriyuki Iwamuro, Hiroshi Yano, Ruito Aiba, Masakazu Baba
Publikováno v:
2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD).
In this study, we investigated the reverse bias safe operating areas (RBSOAs) of three types of state-of-the-art 1.2 kV SiC trench MOSFETs, through experiments and numerical simulations. The experimental results revealed that both SiC trench MOSFETs
Publikováno v:
2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD).
This study investigated the static and dynamic characteristics of a 1.2 kV SiC SBD-integrated trench MOSFET (SWITCH-MOS) and an SBD-integrated planar MOSFET. The SWITCH-MOS exhibited superior switching characteristics to the planar type MOSFET, while
Autor:
Taiga Kanamori, Hiroshi Yano, Kevin Matsui, Masataka Okawa, Shinsuke Harada, Ruito Aiba, Noriyuki Iwamuro
Publikováno v:
2020 32nd International Symposium on Power Semiconductor Devices and ICs (ISPSD).
In this study, we investigated dV DS /dt controllability on gate resistance (R g ) in a 1.2 kV SWITCH-MOS. In the case of large R g , the SWITCH-MOS showed roughly the same dV DS /dt as a conventional SiC trench MOSFET. However, in the case of small