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Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:051601
Large area patterns with small submicron features are difficult to write using conventional electron beam lithography (EBL) methods. This would be more challenging especially if the patterns have large lateral aspect ratios such as waveguide tapers.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4518bf127939cdfd318e363b3eee418f
https://doi.org/10.1116/1.4997018
https://doi.org/10.1116/1.4997018
