Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kevin Burcham"'
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:051601
Large area patterns with small submicron features are difficult to write using conventional electron beam lithography (EBL) methods. This would be more challenging especially if the patterns have large lateral aspect ratios such as waveguide tapers.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4518bf127939cdfd318e363b3eee418f
https://doi.org/10.1116/1.4997018
https://doi.org/10.1116/1.4997018
Autor:
Khodadad, Iman, Nelson-Fitzpatrick, Nathan, Burcham, Kevin, Hajian, Arsen, Saini, Simarjeet S.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Sep2017, Vol. 35 Issue 5, p1-8, 8p
Autor:
Tiecheng Zhu, Yiwen Hu, Gatkine, Pradip, Veilleux, Sylvain, Bland-Hawthorn, Joss, Dagenais, Mario
Publikováno v:
Applied Physics Letters; 3/7/2016, Vol. 108 Issue 10, p101104-1-101104-5, 5p, 2 Diagrams, 2 Charts, 1 Graph
Autor:
ASM International, International Symposium for Testing and Failure Analysis/2011, Electronic Device Failure Analysis Society
This volume features the latest research and practical data from the premier event for the microelectronics failure analysis community. The papers cover a wide range of testing and failure analysis topics of practical value to anyone working to detec
