Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kerstin Oemus"'
Publikováno v:
Toxicology and industrial health. 8(6)
Male and female Wistar rats were exposed to waste gas arising from a plasma etching process in the semiconductor industries for six hr per day, five days per week, for four weeks in order to characterize subacute organ toxicity and genotoxicity. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6efbe3e3b072bb52f834a746c13a0273
https://pubmed.ncbi.nlm.nih.gov/7570623
https://pubmed.ncbi.nlm.nih.gov/7570623
Autor:
Reiner Voigt, Ilona Wolff, F.W. Rath, Siegfried Bauer, P. Hoffmann, Kerstin Oemus, R. Herzschuh, Nadeshda Werner
Publikováno v:
Toxicology and industrial health. 8(3)
In dry etching processes—one of the sources of potential exposure to toxic wastes in the semiconductor industry—complex mixtures of inorganic and organic compounds arise from reactions between feed stock gases (BCl3/Cl2), top layers (aluminium, p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::24257233f660dfd9e387cfa7639a7866
https://pubmed.ncbi.nlm.nih.gov/1386950
https://pubmed.ncbi.nlm.nih.gov/1386950
Autor:
R. Voigt, Ilona Wolff, Kerstin Oemus, B. Merten, R. Hillig, Siegfried Bauer, F.W. Rath, P. Hoffmann, Nadeshda Werner
Publikováno v:
Archives of Toxicology ISBN: 9783540514220
Plasma etching processes in the semiconductor industry are accompanied by the formation of waste products with potential toxicity. There is only limited knowledge about the occupational and environmental risks of these substances.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6aa1c884122e1e7226c858cfeecf9170
https://doi.org/10.1007/978-3-642-74936-0_65
https://doi.org/10.1007/978-3-642-74936-0_65
Autor:
Bauer, Siegfried, Wolff, Ilona, Werner, Nadeshda, Hoffmann, Peter, Herzschuh, R., Oemus, Kerstin, Rath, Friedrich Wilhelm, Voigt, Reiner
Publikováno v:
Toxicology & Industrial Health; May/Jun1992, Vol. 8 Issue 3, p141-156, 16p