Výsledky vyhledávání - "Kerkhof, P.J."

CubeCAT DTE

Autor: Fritz, E.C., Valk, N.C.J. van der, Witvoet, G., Bos, A., Man, H. de, Crowcombe, W.E., Heijden, N. van der, Kerkhof, P.J.

Cube satellite (cubesat) is a specific realization of a smallsat that is characterized by its volume changing in increments of 1dm3, or 1U. A (popular) 3U format cubesat is furthermore classified as a Nano satellite, as it typically has a mass betwee

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Optical satellite communication space terminal technology at TNO

Autor: Saathof, R., Crowcombe, W.E., Kuiper, S., Valk, N.C.J. van der, Pettazzi, F., Lange, T.J. de, Kerkhof, P.J., Riel, M.C.J.M. van, Man, H. de, Truyens, D.C., Ferrario, I.

Publikováno v: Sodnik, Z.Karafolas, N.Cugny, B., Proceedings International Conference on Space Optics, ICSO 2018, 9-12 October 2018, Chania, Greece

Optical communications will complement radio frequency (RF) communications in the coming decades to enhance throughput, power efficiency and link security of satellite communication links. To enable optical communications technology for intersatellit

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First light on EBL2

Autor: Koster, N.B., Sligte, E. te, Molkenboer, F.T., Deutz, A.F., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Westerhout, J.

Publikováno v: Panning, E.M.Goldberg, K.A., Extreme Ultraviolet (EUV) Lithography VIII Conference, 27 February-2 March 2017, San Jose, CA, USA, 10143

TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling inf

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EBL2: high power EUV exposure facility

Autor: Sligte, E. te, Koster, N.B., Molkenboer, F.T., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Hoogstrate A.M., Deutz, A.F.

Publikováno v: Kasprowicz, B.S.Buck, P.D., Photomask Technology, 12 September 2016, San José CA, USA

TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and tes

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