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pro vyhledávání: '"Keraudya, Julien"'
Autor:
Viloana, Rommel Paulo B., Gub, Jiabin, Boyda, Robert, Keraudya, Julien, Li, Liuhe, Helmersson, Ulf
The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films. Energy-reso
Externí odkaz:
http://arxiv.org/abs/1906.06074
