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Autor:
Alain C. Diebold, Lori A. LaVanier, Patricia M. Lindley, David Narum, George Mulholland, Bruno W. Schueler, Kenton David Childs
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:2392-2404
Particulate contamination can result in a significant yield loss during semiconductor device fabrication. As device design rule dimensions decrease the critical defect size also decreases, resulting in the need to analyze smaller defects. Current man