Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Kent H. Nakagawa"'
Publikováno v:
Photomask Technology 2020.
Silicon photonics is becoming a significant platform in high-bandwidth, low power device applications for HPC and cloud computing infrastructure. Its continuing push to displace incumbent copper and VCSEL technologies depends on the scaling potential
Autor:
Richard Gladhill, Kent H. Nakagawa
Publikováno v:
Photomask Technology 2018.
Microfabrication techniques, used widely for the construction of integrated circuits, are being used in an increasing variety of non-IC applications requiring features with curved shapes, such as the construction of photonics and microelectromechanic
Autor:
Edita Tejnil, John L. Sturtevant, Fritz Gans, Paul Ackmann, Kent H. Nakagawa, Ana Armeanu, Michael Lam, Peter Buck, Guoxiang Ning, Christian Buergel, Kostas Adam, Franklin D. Kalk, Steffen Schulze, Michael Oliver, David Fryer, Chris Clifford
Publikováno v:
SPIE Proceedings.
This study quantifies the impact of systematic mask errors on OPC model accuracy and proposes a methodology to reconcile the largest errors via calibration to the mask error signature in wafer data. First, we examine through simulation, the impact of
Autor:
Peter Buck, Guoxiang Ning, Franklin D. Kalk, Kent H. Nakagawa, Steffen Schulze, Christian Buergel, John L. Sturtevant, Fritz Gans, Paul Ackmann, Edita Tejnil
Publikováno v:
SPIE Proceedings.
Computational lithography solutions rely upon accurate process models to faithfully represent the imaging system output for a defined set of process and design inputs. These models rely upon the accurate representation of multiple parameters associat
Autor:
Keith O. Hodgson,‡,§ and, Mary E. Lidstrom, Britt Hedman, Kent H. Nakagawa, Hiep-Hoa T. Nguyen, Sunney I. Chan, Sean Elliott
Publikováno v:
Journal of the American Chemical Society. 118:12766-12776
Parallel X-ray absorption edge and EPR studies of the particulate methane monooxygenase in situ reveal that the enzyme contains unusually high levels of copper ions with a significant portion of th...
Publikováno v:
Optical Microlithography XVIII.
A novel approach to improve the imaging of the critical magnetic pole structure in the disk drive read head is introduced. A 90-degree sub-resolution opening is added to an alternating aperture phase shift mask to reduce a strong proximity effect in
Publikováno v:
SPIE Proceedings.
The data volumes of individual files used in the manufacture of modern integrated circuits have become unmanageable using existing data formats specifications. The ITRS roadmap indicates that single layer MEBES files in 2004 exceed 200 GB threshold,
Autor:
Denny Kamaruddin, Craig A. West, Kent H. Nakagawa, Gregory P. Hughes, Keuntaek Park, Susan S. MacDonald, Bill Wilkinson
Publikováno v:
SPIE Proceedings.
AAPSM masks require OPC correction through pitch in order to print a linear dark line response vs the design CDs. The masks also require correction for the clear intensity imbalance caused by the phased etched Qz wall edge. The clear intensity can be
Publikováno v:
SPIE Proceedings.
An investigation of the predominant industry approaches to transmission balance and phase error through pitch of Alternating Aperture Phase-Shifting Mask manufacturing approaches has been conducted. Previous theoretical studies have shown both clear
Publikováno v:
SPIE Proceedings.
The OASIS format was designed to be a replacement for the GDSII stream format. Previous papers have reported that OASIS files can be 5-20X smaller than comparable GDSII files. This paper examines the storage capabilities of OASIS, as well as other be