Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kent Child"'
Autor:
Jianshe Tang, Jung Ho Han, Chung H. Jeon, Sung Won Park, Bo Xie, Wei Lu, Z Fred Li, Ven Subbaraman, Kent Child, Roman Gouk, Jason Wright, James S. Papanu
Publikováno v:
ECS Transactions. 11:117-122
As the technology node scales down to 45nm and beyond, removal of particles and metal contamination from wafer backsides have become critical for advanced lithography with smaller depth of focus, as well as to enable efficient metrology tool sharing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54fa2abd6538df86b9330e5bd79d0c08
https://doi.org/10.1149/1.2779370
https://doi.org/10.1149/1.2779370
Autor:
Phillip Peters, Michael Belisle, Alexander Sou-Kang Ko, Han-Wen Chen, Pieter Boelen, Kent Child, James S. Papanu, Steven Verhaverbeke, Roman Gouk, Elias Martinez
Publikováno v:
22nd European Mask and Lithography Conference.
Photon induced haze resulting from sulfur residues that remain after cleaning and photoresist stripping is a key challenge for 193 nm photomasks. In previously reported work, sulfur-free processes for cleaning and photoresist removal on mask blanks w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3d90318fd0d698911b9474cd9b39e3e
https://doi.org/10.1117/12.692644
https://doi.org/10.1117/12.692644
Autor:
Steven Verhaverbeke, Brian J. Brown, Kent Child, Roman Gouk, Suresh Shrauti, Cole Franklin, Pieter Boelen, James S. Papanu, Elias Martinez, Alexander Sou-Kang Ko, Han-Wen Chen
Publikováno v:
SPIE Proceedings.
Sub-pellicle defects and haze increase due to photon reaction with cleaning chemistry residues are especially problematic on photomasks for 193 nm and shorter exposure wavelengths. In addition to mask cleaning, these chemistries are also used for pho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbfe44c016eb7f2a3bf281b662a0b602
https://doi.org/10.1117/12.632294
https://doi.org/10.1117/12.632294
Autor:
Weiner B; Clinical Psychologist and Multi-Systemic Therapist, London, UK ben.weiner@nhs.net., Michelagnoli M; Consultant Oncologist, University College Hospital, London, UK., Drake R; Clinical Psychologist, West Kent Child and Adolescent Mental Health Service, Maidstone, Kent, UK., Christie D; Consultant Clinical Psychologist, University College Hospital, London, UK.
Publikováno v:
Journal of pediatric oncology nursing : official journal of the Association of Pediatric Oncology Nurses [J Pediatr Oncol Nurs] 2016 Jan-Feb; Vol. 33 (1), pp. 25-32. Date of Electronic Publication: 2015 Feb 02.