Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Kensuke Shiina"'
Autor:
Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Yuichi Inazuki, Naoya Hayashi
Publikováno v:
SPIE Proceedings.
Autor:
Anto Yasaka, Hiroyuki Shigemura, Fumio Aramaki, Osamu Matsuda, Tomokazu Kozakai, Tsuneo Terasawa, Osamu Suga, Noriaki Takagi, Kensuke Shiina, Tsuyoshi Amano
Publikováno v:
SPIE Proceedings.
In this paper, we will report on the cleaning process durability and light shielding capability of FIB- and EB-CVD (Chemical Vapor Deposition) films which, are applied to repair clear defects on EUV mask. We evaluated tungsten containing, and silicon
Autor:
Anto Yasaka, Yasushi Nishiyama, Hiroyuki Shigemura, Hiroshi Mohri, Kensuke Shiina, Osamu Suga, Tsuyoshi Amano, Tsuneo Terasawa, Tsukasa Abe, Fumio Aramaki
Publikováno v:
SPIE Proceedings.
We evaluated a FIB-CVD (Focused Ion Beam-Chemical Vapor Deposition) process for repairing clear defects on EUV masks. For the CVD film, we selected Carbon material. Our simulation result showed that the properties of wafer-prints depended on the dens
Autor:
Anto Yasaka, Kensuke Shiina, Hiroyuki Shigemura, Tsuyoshi Amano, Tsuneo Terasawa, Fumio Aramaki, Ryoji Hagiwara, Tomokazu Kozakai, Osamu Suga, Yasushi Nishiyama
Publikováno v:
Photomask Technology 2008.
EUV mask damage caused by Ga focused ion beam irradiation during the mask defect repair was studied. The concentration of Ga atom implanted in the multilayer through the buffer layer and distributions of recoil atoms were calculated by SRIM. The refl
Autor:
Kensuke Shiina, Naoya Hayashi, Tsuyoshi Amano, Hiroyuki Shigemura, Fumio Aramaki, Yuuichi Inazuki, Anto Yasaka, Noriaki Takagi, Osamu Suga, Tsuneo Terasawa
Publikováno v:
Photomask Technology 2008.
At the Photomask Japan 2010, we reported on the cleaning process durability and the EUV light shielding capability of FIB- and EB-CVD film based on carbon, tungsten and silicon containing precursors. The results were that the tungsten based FIB-CVD f
Autor:
Anto Yasaka, Kensuke Shiina, Osamu Suga, Tsuyoshi Amano, Yasushi Nishiyama, Tsuneo Terasawa, Shuichi Kikuchi, Ryoji Hagiwara, Hiroyuki Shigemura
Publikováno v:
SPIE Proceedings.
We utilized a newly developed low acceleration voltage FIB (Focused Ion Beam) system a nd evaluated the process for repairing the absorber layer on EUVL mask. During the etching of the absorber layer, which is a step in conventional repair technique,
Autor:
Osamu Suga, Ryoji Hagiwara, Tomokazu Kozakai, Kensuke Shiina, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Syuichi Kikuchi, Yasushi Nishiyama, Anto Yasaka
Publikováno v:
SPIE Proceedings.
EUV mask damage caused by Ga focused ion beam irradiation during the mask defect repair was studied. The concentration of Ga atom implanted in the multilayer through the buffer layer was calculated by SRIM. The reflectivity of the multilayer was calc