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pro vyhledávání: '"Kenjiro Nawa"'
Autor:
Sanjana Das, Elliott Franke, Angelique Raley, Mingmei Wang, Kiyohito Ito, Nihar Mohanty, Eric Liu, Kenjiro Nawa, Devillers Anton J, Richard A. Farrell, Akiteru Ko, Peter Biolsi, David L. O'Meara, Jeffrey S. Smith, Steven Scheer, Alok Ranjan, Kaushik A. Kumar
Publikováno v:
SPIE Proceedings.
Patterning the desired narrow pitch at 10nm technology node and beyond, necessitates employment of either extreme ultra violet (EUV) lithography or multi-patterning solutions based on 193nm-immersion lithography. With enormous challenges being faced
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d361fb6573cc7d2ce9a7d1db705e1451
https://doi.org/10.1117/12.2085016
https://doi.org/10.1117/12.2085016
