Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Kenji Ooki"'
Autor:
Toru Tojo, Akihiko Sekine, Noguchi Shigeru, Masaki Toriumi, T. Takikawa, Ryoichi Hirano, Kiminobu Akeno, Kenji Ooki, T. Shinoda, Munehiro Ogasawara, Shusuke Yoshitake
Publikováno v:
Japanese Journal of Applied Physics. 41:5835-5840
Electron beam mask writing is one of the most promising technologies for reliable fine mask patterning in present and future optical lithography. To establish a high performance mask writing system, not only the development of breakthrough technologi
Publikováno v:
TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A. 58:2254-2259
The behavior of a surface crack crossing the fusion line is studied experimentally and numerically. By changing the aspect ratio of the surface crack, three kinds of surface-cracked specimens are tested. The distributions of Δa, CTOD and CTOA values
Autor:
Shusuke Yoshitake, Kenji Ooki, Ryoichi Hirano, Toru Tojo, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Masaki Toriumi, Yoshiaki Tada
Publikováno v:
SPIE Proceedings.
Autor:
Yoshiaki Tada, Teruaki Yamamoto, Yoji Ogawa, Shusuke Yoshitake, Toru Tojo, Ryoichi Hirano, Masaki Toriumi, Kenji Ooki, Katsuhito Ogura
Publikováno v:
SPIE Proceedings.
Meeting the latest requirements of aggressive users for the advanced mask for optical lithography will be difficult. In addition, improving the productivity and throughput of the advanced mask with high-density pattern data is necessary. To overcome
Autor:
Naoharu Shimomura, Yoshio Suzuki, Kimio Suzuki, Yoshiaki Hattori, Osamu Watanabe, Souji Koikari, Kiyomi Koyama, Kenji Ooki, Ryoichi Hirano, Noboru Yamada, Hideo Kusakabe, Satoshi Yasuda, Shinsuke Nishimura, Kenji Ohtoshi, Susumu Oogi, Hiroshi Hoshino, Susumu Watanabe, Hitoshi Higurashi, Takayuki Abe, Mitsuko Shimizu, Masaki Toriumi, Shigehiro Hara, Hirohito Anze, Yasuo Suzuki, Shiro Kurasawa, Kazuo Tsuji, Shusuke Yoshitake, Tadahiro Takigawa, Tomohiro Iijima, Takashi Kamikubo, Tetsu Akiyama, Hiroaki Suzuki, Shuichi Tamamushi, Mitsuhiro Yano, Toru Tojo, Ryoji Yoshikawa, Eiji Murakami, Mitsunobu Katayama, Kazuyuki Okuzono, Munehiro Ogasawara, Akira Noma, Koji Handa, Kazuto Matsuki, Hirokazu Yamada, Noriaki Nakayamada, Kiyoshi Hattori, Yuuji Fukudome, Yoshiaki Tada, Seiichi Tsuchiya, Yoji Ogawa, Kiminobu Akeno, Hideyuki Tsurumaki
Publikováno v:
SPIE Proceedings.
Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology
Autor:
Munehiro Ogasawara, Kenji Ooki, Naoharu Shimomura, Noriaki Nakayamada, Jun Takamatsu, Toru Tojo, Fumiyuki Okabe, Shusuke Yoshitake
Publikováno v:
SPIE Proceedings.
Background exposure of a resist caused by scattered electrons (the fogging effect) degrades critical dimension accuracy when the pattern density changes over the specimen. We measured the fogging effect in an electron beam optical column. In order to
Autor:
Humiyuki Okabe, Munehiro Ogasawara, Naoharu Shimomura, Kenji Ooki, Shusuke Yoshitake, Toru Tojo, Noriaki Nakayamada, Jun Takamatsu, Tadahiro Takigawa
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17:2936
We have developed an antireflecting plate with a novel structure to reduce the long-range fogging effect, which is especially serious in mask writing by a high acceleration voltage electron beam mask writing system. This structure is characterized by
Conference
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