Zobrazeno 1 - 10
of 34
pro vyhledávání: '"Kenichiro YOSHITOMI"'
Autor:
Kenichiro YOSHITOMI
Publikováno v:
Journal of the Japan Society for Precision Engineering. 89:382-386
Publikováno v:
International Journal of Automation Technology. 17:55-63
An increased removal rate is required to improve the production efficiency during the polishing of ultrahard-to-process materials. The rotational speed of the polishing pad is increased to increase the removal rate. However, research has not been ext
Autor:
Kenichiro Yoshitomi, Atsunobu Une
Publikováno v:
Journal of the Japan Society for Precision Engineering. 86:620-625
Autor:
Atsunobu Une, Kenichiro Yoshitomi
Publikováno v:
International Journal of Automation Technology. 14:633-643
High precision is required for thin substrates used in the manufacturing processes for semiconductor devices and flat panel displays, and the required precision for substrate warp becomes more stringent every year. However, it is difficult to remove
Publikováno v:
Precision Engineering. 64:45-52
In planarizing a thin substrate, it has been difficult to remove warp or waviness as such substrates are forcibly deformed by conventional clamping methods. To clamp a thin substrate with no deformation, we have developed a freezing pin chuck system
Publikováno v:
Journal of the Japan Society for Precision Engineering. 85:787-792
Publikováno v:
Journal of the Japan Society for Precision Engineering. 83:275-280
Publikováno v:
Journal of the Japan Society for Precision Engineering. 82:82-86
Publikováno v:
Advanced Materials Research. 1136:245-250
The use of hard and brittle materials for manufacturing optical parts, such as dies and molds are required in order to extend mold life. Although, cobalt-free tungsten carbide is one of the hardest materials, micro-cutting is very difficult due to it
Autor:
Atsunobu Une, Kenichiro Yoshitomi
Publikováno v:
Journal of the Japan Society for Precision Engineering. 80:815-819