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pro vyhledávání: '"Kenichi Kotaki"'
Autor:
Noriyuki Unno, Nobuji Sakai, Hiroshi Goto, Jun Mizuno, Norio Yoshino, Jun Taniguchi, Kenichi Kotaki, Hidetoshi Shinohara, Kentaro Tsunozaki, Hiroto Miyake
Publikováno v:
Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c936fb1649a88b9b3dce846b4e3cab3
https://doi.org/10.1002/9781118535059.ch5
https://doi.org/10.1002/9781118535059.ch5
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29:06FC02
Nanoimprint lithography (NIL) is a very useful technique for the fabrication of nanopatterns, and it is used in some practical applications. The key issue for mass production is the understanding of the lifetime and deterioration of the release coati