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pro vyhledávání: '"Ken-ichi Machinaga"'
Autor:
Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Ken-ichi Machinaga, Jun Taniguchi
Publikováno v:
Microelectronic Engineering. 87:918-921
Ultra violet nanoimprint lithography (UV-NIL), which is able to obtain the nano-scale pattern effectively and quickly, is strongly desired for the next-generation lithography technology. However, it is well known that the higher viscosity UV-curable
Publikováno v:
Microelectronic Engineering. 86:676-680
The filling behavior of resin during UV nanoimprint lithography (UV-NIL) was observed by using a ''midair structure mold'' and by changing the imprint pressure. The midair structure molds were fabricated by electron beam lithography (EBL) using hydro
Autor:
Ken ichi Machinaga, Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Jun Taniguchi
Publikováno v:
Journal of Photopolymer Science and Technology. 22:161-166
Next-generation fine patterning requires a high throughput cost-effective process for the mass producing of various devices, which has a nanometer-scale pattern over a large area. UV nanoimprint lithography (UV-NIL) is a major breakthrough in this fi
Publikováno v:
Seikei-Kakou. 21:346-350