Výsledky vyhledávání

Further Physical Characteristics of Vacuum vs. Atmospheric Baked Polymers for FOWLP Processing

Autor: Charadutta Galande, Kaushal Singh, Ken Sautter, Bill Moffat, Zia Karim

Publikováno v: Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT). 2019:001257-001269

While there are a number of different polymer cure processes, the specific process has a significant effect on the quality and performance of cured polymers, applicable to FOWLP Multi-level Metallization Process. The measurement for variations of noi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1cc44f51a12309d2af45da34fe0aeafe
https://doi.org/10.4071/2380-4491-2019-dpc-presentation_tha2_012

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Effect of Surface Free Energy on PDMS Transfer in Microcontact Printing and Its Application to ToF-SIMS to Probe Surface Energies

Autor: Li Yang, Matthew C. Asplund, Gaurav Saini, Takashi Nakanishi, Ken Sautter, Matthew R. Linford, Naoto Shirahata, Feng Zhang, Dirk G. Kurth, Lei Pei, Katsuhiko Ariga, Vincent S. Smentkowski

Publikováno v: Langmuir. 25:5674-5683

Although polydimethylsiloxane (PDMS) transfer during microcontact printing (microCP) has been observed in previous reports, which generally focused on only one or a few different substrates, in this work we investigate the extent of PDMS transfer ont

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b5f16bd77eb033fe331c1ecbd98caca4
https://doi.org/10.1021/la804272n

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Two-silane chemical vapor deposition treatment of polymer (nylon) and oxide surfaces that yields hydrophobic (and superhydrophobic), abrasion-resistant thin films

Autor: Ken Sautter, Matthew R. Linford, Frank E. Hild, Gaurav Saini, Jerry Pauley

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:1224-1234

This article describes a two-silane, chemical vapor deposition (CVD) approach to creating hydrophobic (or even superhydrophobic), abrasion-resistant coatings on silicon oxide and polymer (nylon) substrates. This multistep approach employs only reagen

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::95201a741650ef625d3722bf0abc00d1
https://doi.org/10.1116/1.2953699

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Subsurface Oxidation for Micropatterning Silicon (SOMS)

Autor: Robert C. Davis, Ken Sautter, Matthew R. Linford, Feng Zhang

Publikováno v: Langmuir. 25:1289-1291

Here we present a straightforward patterning technique for silicon: subsurface oxidation for micropatterning silicon (SOMS). In this method, a stencil mask is placed above a silicon surface. Radio-frequency plasma oxidation of the substrate creates a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ced95b8c07c1cc8bcc9ad430fa1d9ca4
https://doi.org/10.1021/la803408x

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Chemical vapor deposition of three aminosilanes on silicon dioxide: surface characterization, stability, effects of silane concentration, and cyanine dye adsorption

Autor: Robert C. Davis, Adam M. Larsen, Hussein Samha, Matthew R. Linford, Daniel A. Findley, Ken Sautter, Feng Zhang

Publikováno v: Langmuir : the ACS journal of surfaces and colloids. 26(18)

Covalently bonded monolayers of two monofunctional aminosilanes (3-aminopropyldimethylethoxysilane, APDMES, and 3-aminopropyldiisopropylethoxysilane, APDIPES) and one trifunctional aminosilane (3-aminopropyltriethoxysilane, APTES) have been deposited

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f04e04eb9341c8d335545217d9e4b1f9
https://pubmed.ncbi.nlm.nih.gov/20731334

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Akademický článek

Subsurface Oxidation for Micropatterning Silicon (SOMS).

Autor: Feng Zhang, Ken Sautter, Robert C. Davis, Matthew R. Linford

Publikováno v: Langmuir; Feb2009, Vol. 25 Issue 3, p1289-1291, 3p

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