Zobrazeno 1 - 10
of 52
pro vyhledávání: '"Ken Miyagi"'
Autor:
Takuya Isono, Ema Baba, Shunma Tanaka, Ken Miyagi, Takahiro Dazai, Feng Li, Takuya Yamamoto, Kenji Tajima, Toshifumi Satoh
Publikováno v:
Polymer Chemistry.
Although polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is the most widely employed template and scaffold for constructing nanoscale patterns, its relatively small Flory-Huggins interaction parameter makes it challenging to realize microphas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::03f5c014bfb0fe2fb5bb0a3a31a1cd07
https://doi.org/10.1039/d3py00113j
https://doi.org/10.1039/d3py00113j
Autor:
Derek Nowak, Paulina Rincon Delgadillo, Albrecht Thomas R, Akiyoshi Yamazaki, Xuanxuan Chen, Takaya Maehashi, Paul F. Nealey, Ken Miyagi, R. Joseph Kline, Takahiro Dazai, Daniel F. Sunday
Publikováno v:
Chemistry of Materials. 32:2399-2407
The challenges of patterning next-generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost-effective size ...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eccd82139bdc7d1e613ea58b27814ad3
https://doi.org/10.1021/acs.chemmater.9b04833
https://doi.org/10.1021/acs.chemmater.9b04833
Autor:
Daniel F, Sunday, Xuanxuan, Chen, Thomas R, Albrecht, Derek, Nowak, Paulina Rincon, Delgadillo, Takahiro, Dazai, Ken, Miyagi, Takaya, Maehashi, Akiyoshi, Yamazaki, Paul F, Nealey, R Joseph, Kline
Publikováno v:
Chem Mater
The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::238a3075cd2017eafb41dee015c3f3fd
https://pubmed.ncbi.nlm.nih.gov/33100517
https://pubmed.ncbi.nlm.nih.gov/33100517
Autor:
Ken Miyagi, Takuya Yamamoto, Akiyoshi Yamazaki, Kohei Yoshida, Toshifumi Satoh, Takuya Isono, Lin Tian, Kenji Tajima, Hiroaki Mamiya
Publikováno v:
Macromolecules. 51:8064-8072
Nanofabrication based on block copolymer self-assembly is one of the most promising methods for producing nanopatterns with a sub-10 nm feature size. Although polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) has been widely studied as a suitab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b27b71dd4f691fdea0f0f14f7179ffb
https://doi.org/10.1021/acs.macromol.8b01454
https://doi.org/10.1021/acs.macromol.8b01454
Autor:
Ken Miyagi, Norihiko Sukenaga, Yuka Matsuki, Kenji Shigemi, Lynn Maeda, Maki Mizogami, Munetaka Hirose, Takashi Tsunetoh
Publikováno v:
Journal of Anesthesia. 32:403-408
The Douleur Neuropathique 4 questionnaire (DN4) is a simple and objective tool developed by the French Neuropathic Pain Group to screen for neuropathic pain. This prospective observational study was undertaken in three hospitals to assess the validit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dacc128ef4e0a778adc54eea19e8c2c5
https://doi.org/10.1007/s00540-018-2495-7
https://doi.org/10.1007/s00540-018-2495-7
Autor:
Lei Wang, Naoko Kihara, Yuriko Seino, Yasunari Yoshimura, Yuki Tanaka, Alvin Chandra, Yoshinori Suzuki, Rina Maeda, Hideaki Yokoyama, Christopher K. Ober, Yuusuke Kasahara, Ken Miyagi, Hiroki Takano, Hironobu Sato, Ryuichi Nakatani, Shinya Minegishi, Teruaki Hayakawa, Tsukasa Azuma
Publikováno v:
ACS Applied Materials & Interfaces. 9:31266-31278
In this study, a series of perpendicular lamellae-forming poly(polyhedral oligomeric silsesquioxane methacrylate-block-2,2,2-trifluoroethyl methacrylate)s (PMAPOSS-b-PTFEMAs) was developed based on the bottom-up concept of creating a simple yet effec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c0f0368afd5fc34079f73e36c2b99906
https://doi.org/10.1021/acsami.6b16129
https://doi.org/10.1021/acsami.6b16129
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9673232672551f03b9c48f9a4b212311
https://doi.org/10.1117/12.2515933
https://doi.org/10.1117/12.2515933
Autor:
Lei Wang, Yuriko Seino, Alvin Chandra, Ken Miyagi, Naoko Kihara, Yuki Tanaka, Shinya Minegishi, Rina Maeda, Yusuke Kasahara, Christopher K. Ober, Ryuichi Nakatani, Hiroki Takano, Teruaki Hayakawa, Tsukasa Azuma, Hironobu Sato
Publikováno v:
Journal of Photopolymer Science and Technology. 29:705-708
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd701d6a3289762f2e95f39a2f4312b8
https://doi.org/10.2494/photopolymer.29.705
https://doi.org/10.2494/photopolymer.29.705
Autor:
Katsutoshi Kobayashi, Hideki Kanai, Toshikatsu Tobana, Ken Miyagi, Hironobu Sato, Yusuke Kasahara, Hitoshi Yamano, Yuriko Seino, Naoko Kihara, Masayuki Shiraishi, Tsukasa Azuma, Shinya Minegishi, Yoshiaki Kawamonzen, Satoshi Nomura, Hitoshi Kubota, Katsuyoshi Kodera
Publikováno v:
Journal of Photopolymer Science and Technology. 29:647-652
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::491f954163a8279d84e17d4ea201e601
https://doi.org/10.2494/photopolymer.29.647
https://doi.org/10.2494/photopolymer.29.647
Autor:
Hiroki Takano, Lei Wang, Yuki Tanaka, Rina Maeda, Naoko Kihara, Yuriko Seino, Hironobu Sato, Yoshiaki Kawamonzen, Ken Miyagi, Shinya Minegishi, Tsukasa Azuma, Christopher K. Ober, Teruaki Hayakawa
Publikováno v:
Journal of Photopolymer Science and Technology. 29:11-15
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2cf365847857e9eb6b3f849592f7c17
https://doi.org/10.2494/photopolymer.29.11
https://doi.org/10.2494/photopolymer.29.11