Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Ken Maruyama"'
Autor:
Takashi Wada, Kazumi Mori‐Anai, Akiko Takahashi, Takahiro Matsui, Masaya Inagaki, Mitsutaka Iida, Ken Maruyama, Hidetaka Tsuda
Publikováno v:
Journal of Diabetes Investigation, Vol 13, Iss 12, Pp 1981-1989 (2022)
Abstract Aims/Introduction The Canagliflozin and Renal Events in Diabetes with Established Nephropathy Clinical Evaluation (CREDENCE) trial has shown the effects of canagliflozin on preventing clinically important kidney outcomes in patients with typ
Externí odkaz:
https://doaj.org/article/f05252155e864ece91c83385bbe47762
Autor:
Kazuo Misue, Takamasa Kawagoe, Ken Maruyama, Hsiang-Yun Wu, Masatoshi Arikawa, Shigeo Takahashi
Publikováno v:
International Journal of Art, Culture, Design, and Technology. 8:31-50
Schematizing railway networks for better readability is often achieved by aligning railway lines along the octilinear directions. However, such railway map layouts require further adjustment when placing station name labels. In this article, the auth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0dc4d92a1898b7106d710d2e2703da64
https://doi.org/10.4018/ijacdt.2019010103
https://doi.org/10.4018/ijacdt.2019010103
Autor:
Tetsurou Kaneko, Nishikori Katsuaki, Kasahara Kazuki, Tomohiko Sakurai, Ken Maruyama, Satoshi Dei, Ramakrishnan Ayothi
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Extreme ultraviolet (EUV) lithography is in the phase of first generation of high volume manufacturing. Next generation EUV lithography requires further improvement of resist performance such as resolution, sensitivity and pattern roughness. Therefor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4fe143ab13ea13287bc9105960dda197
https://doi.org/10.1117/12.2551968
https://doi.org/10.1117/12.2551968
Publikováno v:
ACM SIGAPP Applied Computing Review. 17:26-34
Signature verification is one of the most popular subjects in pattern recognition. Many kinds of verification methods for online handwritten signatures have basically used the individual features of signatures. However, how to reflect inter-stroke in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::422cbc66c85fa6db11bee872e2c88b80
https://doi.org/10.1145/3090058.3090062
https://doi.org/10.1145/3090058.3090062
Publikováno v:
IV (1)
The consistent arrangement of map features in accordance with the map scale has recently been technically important in digital cartographic generalization. This is primarily due to the recent demand for informative mapping systems, especially for use
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc5f32a45173b6a925d97b5a82ffc753
https://doi.org/10.1109/iv.2019.00022
https://doi.org/10.1109/iv.2019.00022
Autor:
Takamasa Kawagoe, Masatoshi Arikawa, Yuka Yoshida, Shigeo Takahashi, Ken Maruyama, Hsiang-Yun Wu
Publikováno v:
IV
Octilinear network layouts are commonly used as the schematic representation of railway maps due to their enhanced readability. However, it is often time-consuming to place station names on such railway maps by trial and error, especially within the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b595caff44c2ac9fa193aa7793920b1
https://doi.org/10.1109/iv.2018.00070
https://doi.org/10.1109/iv.2018.00070
Autor:
Akihiro Oshima, Seiichi Tagawa, Hiroyuki Ide, Serge Biesemans, Kosuke Yoshihara, Yoshitaka Konishi, Danilo De Simone, Masafumi Hori, Teruhiko Moriya, Hayakawa Makoto, Hans-Jürgen Stock, Yuya Kamei, Kathleen Nafus, Ryo Aizawa, Ken Maruyama, Takahiro Shiozawa, Yoshihiro Kondo, Motoyuki Shima, Kazuhiro Takeshita, Michael A. Carcasi, Masashi Enomoto, Toru Kimura, Yukie Minekawa, Tomoki Nagai, Gosuke Shiraishi, Hideo Nakashima, Masayuki Miyake, Hisashi Nakagawa, Geert Vandenberghe, Keisuke Yoshida, Masaru Tomono, John S. Petersen, Balint Meliorisz, Takehiko Naruoka, Ryo Shimada, Seiji Nagahara, Satoshi Dei, Foubert Philippe
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Photosensitized Chemically Amplified ResistTM (PSCARTM) **2.0’s advantages and expectations are reviewed in this paper. Alpha PSCAR in-line UV exposure system (“Litho Enhancer”) was newly installed at imec in a Tokyo Electron Ltd. (TELTM)’s C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::824dfca6e19a82aae0a388d175fc1216
https://doi.org/10.1117/12.2297498
https://doi.org/10.1117/12.2297498
Autor:
Hideo Nakashima, Geert Vandenberghe, Masafumi Hori, Gosuke Shiraishi, Michael A. Carcasi, Masayuki Miyake, Seiji Nagahara, Hiroyuki Ide, Yuya Kamei, Satoshi Dei, Hisashi Nakagawa, Yukie Minekawa, Kosuke Yoshihara, Kathleen Nafus, Yoshihiro Kondo, Tomoki Nagai, Masaru Tomono, Motoyuki Shima, Philippe Foubert, Kazuhiro Takeshita, Ryo Shimada, John S. Petersen, Serge Biesemans, Takehiko Naruoka, Ken Maruyama, Danilo De Simone, Teruhiko Moriya, Akihiro Oshima, Seiichi Tagawa
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
In order to lower the cost of ownership of EUV lithography, high sensitivity EUV resists , enabling higher throughput of EUV scanners are being explored. The concept that utilizes a Photosensitized Chemically Amplified ResistTM (PSCARTM) is a promisi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ab6015c9a8ddc7415432bf2b276d2b0
https://doi.org/10.1117/12.2297370
https://doi.org/10.1117/12.2297370
Autor:
Kaori Sakai, Ken Maruyama, Kazunori Sakai, Andreia Santos, Takehiko Naruoka, Ramakrishnan Ayothi, Koji Inukai, Motohiro Shiratani, Tomohisa Fujisawa, Tomoki Nagai, Kenji Hoshiko
Publikováno v:
Journal of Photopolymer Science and Technology. 27:639-644
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::91244601ed5225cacfde8a85cf05db10
https://doi.org/10.2494/photopolymer.27.639
https://doi.org/10.2494/photopolymer.27.639
Publikováno v:
RACS
Various verification methods for on-line handwritten signatures have been proposed; however, reflecting inter-stroke information in the verification has not been considered. Hence, this paper suggests a verification method that uses Shape Context. In
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d8c1b47c812b661f50da0a30625e208
https://doi.org/10.1145/2987386.2987440
https://doi.org/10.1145/2987386.2987440