Výsledky vyhledávání - "Kelvin Walch"

SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

Autor: Geert Vandenberghe, A. Meyyappan, Sylvain Muckenhirn, Kelvin Walch, Mark John Maslow, Johannes van Wingerden

Publikováno v: SPIE Proceedings.

As dimensions get smaller and circuits get more complex, the demand for comprehensive measurements of reticule geometries increases. 3D characterization of phase shift mask (PSM) is required to understand the quality of the transferred image. To avoi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f931b842d45449b0fe847228f51228f9
https://doi.org/10.1117/12.436742

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Measurement of sidewall, line, and line-edge roughness with scanning probe microscopy

Autor: Kelvin Walch, Sylvain Muckenhirn, A. Meyyappan, Jacques Margail

Publikováno v: SPIE Proceedings.

Decreasing dimensions of features in semiconductor device manufacturing makes it imperative to control the sidewall, line and line-edge roughness. The roughness contributes to the variation in critical dimension (CD) and it might affect device functi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5f47861636ccea8e83a97bcb4922d48f
https://doi.org/10.1117/12.436800

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