Zobrazeno 1 - 10
of 90
pro vyhledávání: '"Kelkar MS"'
Autor:
Purohit HS; Small molecule CMC development, Drug Product Development, AbbVie Inc., North Chicago, IL, USA. Electronic address: Hitesh.purohit@abbvie.com., Zhou D; Small Molecule Drug Product Development, BeiGene, Beijing, China., Yu M; Small molecule CMC development, Drug Product Development, AbbVie Inc., North Chicago, IL, USA., Zaroudi M; MilliporeSigma, Temecula, CA, USA., Oberoi H; Small molecule CMC development, Drug Product Development, AbbVie Inc., North Chicago, IL, USA., López ALR; NBE, Drug Product Development, AbbVie Inc., North Chicago, IL, USA., Kelkar MS; Small molecule CMC development, Process Engineering, AbbVie Inc., North Chicago, IL, USA., He Y; Small molecule CMC development, Analytical Research and Development, AbbVie Inc., North Chicago, IL, USA., Gates B; Small molecule CMC development, Process Chemistry, AbbVie Inc., North Chicago, IL, USA., Nere N; Small molecule CMC development, Process Engineering, AbbVie Inc., North Chicago, IL, USA., Law D; Small molecule CMC development, Drug Product Development, AbbVie Inc., North Chicago, IL, USA. Electronic address: Devalina.law@abbvie.com.
Publikováno v:
Journal of pharmaceutical sciences [J Pharm Sci] 2024 Apr; Vol. 113 (4), pp. 1007-1019. Date of Electronic Publication: 2023 Oct 11.
Autor:
Coliaie P; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607, United States., Bhawnani RR; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607, United States., Ali R; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607, United States., Kelkar MS; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, Illinois 60064, United States., Korde A; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, Illinois 60064, United States., Langston M; Pharmaceutics Research-Analytical Development, Takeda Pharmaceuticals International Co., Cambridge, Massachusetts 02139, United States., Liu C; Pharmaceutical Development, Biogen, Cambridge, Massachusetts 02142, United States., Nazemifard N; Pharmaceutics Research-Analytical Development, Takeda Pharmaceuticals International Co., Cambridge, Massachusetts 02139, United States., Patience DB; Chemical Process Development, Biogen, Cambridge, Massachusetts 02142, United States., Rosenbaum T; Bristol-Myers Squibb Co., Drug Product Science & Technology, New Brunswick, New Jersey 08901, United States., Skliar D; Bristol Myers Squibb Co., Chemical & Synthetic Development, New Brunswick, New Jersey 08901, United States., Nere NK; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607, United States.; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, Illinois 60064, United States., Singh MR; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607, United States.
Publikováno v:
ACS omega [ACS Omega] 2023 Oct 23; Vol. 8 (44), pp. 41502-41511. Date of Electronic Publication: 2023 Oct 23 (Print Publication: 2023).
Autor:
Coliaie P; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St., Chicago, IL 60607, USA. mrsingh@uic.edu., Prajapati A; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St., Chicago, IL 60607, USA. mrsingh@uic.edu., Ali R; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St., Chicago, IL 60607, USA. mrsingh@uic.edu., Boukerche M; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Korde A; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Kelkar MS; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Nere NK; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St., Chicago, IL 60607, USA. mrsingh@uic.edu.; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Singh MR; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St., Chicago, IL 60607, USA. mrsingh@uic.edu.
Publikováno v:
Lab on a chip [Lab Chip] 2022 Jun 14; Vol. 22 (12), pp. 2299-2306. Date of Electronic Publication: 2022 Jun 14.
Autor:
Coliaie P; Department of Chemical Engineering, University of Illinois Chicago, Chicago, Illinois 60607, United States., Prajapati A; Department of Chemical Engineering, University of Illinois Chicago, Chicago, Illinois 60607, United States., Ali R; Department of Chemical Engineering, University of Illinois Chicago, Chicago, Illinois 60607, United States., Korde A; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, Illinois 60064, United States., Kelkar MS; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, Illinois 60064, United States., Nere NK; Department of Chemical Engineering, University of Illinois Chicago, Chicago, Illinois 60607, United States.; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, Illinois 60064, United States., Singh MR; Department of Chemical Engineering, University of Illinois Chicago, Chicago, Illinois 60607, United States.
Publikováno v:
ACS sensors [ACS Sens] 2022 Mar 25; Vol. 7 (3), pp. 797-805. Date of Electronic Publication: 2022 Jan 19.
Autor:
Coliaie P; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St, Chicago, IL 60607, USA. mrsingh@uic.edu., Bhawnani RR; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St, Chicago, IL 60607, USA. mrsingh@uic.edu., Prajapati A; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St, Chicago, IL 60607, USA. mrsingh@uic.edu., Ali R; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St, Chicago, IL 60607, USA. mrsingh@uic.edu., Verma P; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22903, USA., Giri G; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22903, USA., Kelkar MS; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Korde A; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Langston M; Pharmaceutics Research - Analytical Development, Takeda Pharmaceuticals International Co., Cambridge, MA 02139, USA., Liu C; Pharmaceutical Development, Biogen, Cambridge, MA 02142, USA., Nazemifard N; Pharmaceutics Research - Analytical Development, Takeda Pharmaceuticals International Co., Cambridge, MA 02139, USA., Patience D; Chemical Process Development, Biogen, Cambridge, MA 02142, USA., Rosenbaum T; Bristol-Myers Squibb Co., Drug Product Science & Technology, New Brunswick, NJ 08901, USA., Skliar D; Bristol Myers Squibb Co., Chemical & Synthetic Development, New Brunswick, NJ 08901, USA., Nere NK; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St, Chicago, IL 60607, USA. mrsingh@uic.edu.; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Singh MR; Department of Chemical Engineering, University of Illinois Chicago, 929 W. Taylor St, Chicago, IL 60607, USA. mrsingh@uic.edu.
Publikováno v:
Lab on a chip [Lab Chip] 2022 Jan 18; Vol. 22 (2), pp. 211-224. Date of Electronic Publication: 2022 Jan 18.
Autor:
Coliaie P; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, USA. mrsingh@uic.edu., Kelkar MS; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Langston M; Pharmaceutics Research - Analytical Development, Takeda Pharmaceuticals International Co., Cambridge, MA 02139, USA., Liu C; Pharmaceutical Development, Biogen, Cambridge, MA 02142, USA., Nazemifard N; Chemical Process Development, Takeda Pharmaceuticals International Co., Cambridge, MA 02139, USA., Patience D; Pharmaceutical Development, Biogen, Cambridge, MA 02142, USA., Skliar D; Chemical Process Development, Product Development, Bristol Myers Squibb Co., New Brunswick, NJ 08901, USA., Nere NK; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, USA. mrsingh@uic.edu and Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Singh MR; Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, USA. mrsingh@uic.edu.
Publikováno v:
Lab on a chip [Lab Chip] 2021 Jun 15; Vol. 21 (12), pp. 2333-2342.
Autor:
Coliaie P; Department of Chemical Engineering, University of Illinois at Chicago, 810 S. Clinton St., Chicago, IL 60607, USA. mrsingh@uic.edu., Kelkar MS; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Nere NK; Center of Excellence for Isolation & Separation Technologies (CoExIST), Process R&D, AbbVie Inc., North Chicago, IL 60064, USA., Singh MR; Department of Chemical Engineering, University of Illinois at Chicago, 810 S. Clinton St., Chicago, IL 60607, USA. mrsingh@uic.edu.
Publikováno v:
Lab on a chip [Lab Chip] 2019 Jul 21; Vol. 19 (14), pp. 2373-2382. Date of Electronic Publication: 2019 Jun 21.
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Autor:
Das, Anshuman, Raman, Rajan, Roy, Soumikh, Gajrani, Kishor Kumar, Ghosh, Sachidananda, Das, Sudhansu Ranjan
Publikováno v:
Journal of the Brazilian Society of Mechanical Sciences & Engineering; Sep2024, Vol. 46 Issue 9, p1-27, 27p
Autor:
Bhakri, Kanika1 (AUTHOR), Chakraborty, Nabaparna2 (AUTHOR), Juglan, K. C.1 (AUTHOR) kc.juglan@lpu.co.in, Kumar, Harsh3 (AUTHOR), Sharma, Ravinder3 (AUTHOR)
Publikováno v:
Journal of Thermal Analysis & Calorimetry. Jul2023, Vol. 148 Issue 14, p7185-7205. 21p.