Zobrazeno 1 - 10
of 51
pro vyhledávání: '"Keita SAKAI"'
Publikováno v:
Heliyon, Vol 6, Iss 3, Pp e03524- (2020)
The most widely used animal models to develop sleep-disorder drugs are rodents, particularly rats and mice. However, unlike humans, these rodents are nocturnal. Thus, diurnal non-human primates represent a valuable and more translational animal model
Externí odkaz:
https://doaj.org/article/f3ef003b167f454595777c07557985bf
Publikováno v:
AIP Advances, Vol 9, Iss 5, Pp 055317-055317-5 (2019)
Artificial electronic synapses or synaptic devices, which are capable of mimicking the functions of biological synapses in the human brain, are considered the basic building blocks for brain-inspired computing. Therefore, we investigated the emulatio
Externí odkaz:
https://doaj.org/article/718da532c31949cba121762c01cb2812
Autor:
Makoto Ogusu, Masaki Ishida, Masahiro Tamura, Keita Sakai, Toshiki Ito, Yuto Ito, Isao Kawata, Hideki Kunugi, Shuhei Tamura, Ryuichi Asako, Keisuke Tanaka, Tomohito Yamaji
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37bd4a23718395c382719c0b43977f0c
https://doi.org/10.1117/12.2658125
https://doi.org/10.1117/12.2658125
Autor:
Keita Sakai, Shoichi Sasaki
Publikováno v:
Physical Review
Removing ultraviolet noise from the gauge fields is necessary for glueball spectroscopy in lattice QCD. It is known that the Yang-Mills gradient flow method is an alternative approach instead of link smearing or link fuzzing in various aspects. In th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::98f20256d0cf756a1e78b37af6d60cc9
http://arxiv.org/abs/2211.15176
http://arxiv.org/abs/2211.15176
Autor:
Makoto Ogusu, Masaki Ishida, Masahiro Tamura, Keita Sakai, Toshiki Ito, Yuto Ito, Isao Kawata, Hdeki Kunugi, Shuhei Tamura, Ryuichi Asano, Keisuke Tanaka, Tomohito Yamaji
Publikováno v:
Novel Patterning Technologies 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9635ae4f46c73836ff16804a7356aaa0
https://doi.org/10.1117/12.2615934
https://doi.org/10.1117/12.2615934
Autor:
Keita Sakai, Shoichi Sasaki
Publikováno v:
Proceedings of The 38th International Symposium on Lattice Field Theory — PoS(LATTICE2021).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2739ff74768c0828497c00d5220f514d
https://doi.org/10.22323/1.396.0333
https://doi.org/10.22323/1.396.0333
Publikováno v:
Journal of Vacuum Science & Technology B. 40:053202
Building an artificial synaptic device with multiple presynaptic inputs will be a significant step toward realization of sophisticated brain-inspired platforms for neuromorphic computing. However, an artificial synapse that can mimic functions of mul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::519af6d02e22784f901e7f95de9e2359
https://doi.org/10.1116/6.0002081
https://doi.org/10.1116/6.0002081
Autor:
Toshiya Asano, Takehiko Iwanaga, Yuichiro Oguchi, Naoki Kiyohara, Yukio Takabayashi, Koshiro Suzuki, Junichi Seki, Hiromi Hiura, Mitsuru Hiura, Kohei Nagane, Osamu Morimoto, Keita Sakai
Publikováno v:
Photomask Technology 2020.
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overco
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::674cea64dab4fc0a43d4371e1545f345
https://doi.org/10.1117/12.2574629
https://doi.org/10.1117/12.2574629
Autor:
Tetsuro Ogushi, Keita Sakai
Publikováno v:
Netsu Bussei. 33:107-116
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ae1a620f4f46ef7ce53876107e2306a
https://doi.org/10.2963/jjtp.33.107
https://doi.org/10.2963/jjtp.33.107
Autor:
Mitsuru Hiura, Anshuman Cherala, Tatsuya Hayashi, Wei Zhang, Mario J. Meissl, Takamitsu Komaki, Yukio Takabayashi, Takehiko Iwanaga, Hiroshi Morohoshi, Osamu Morimoto, Se-Hyuk Im, Keita Sakai, Jin Choi
Publikováno v:
2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
Any new lithographic technology to be introduced into manufacturing must deliver either a performance advantage or a cost advantage. Key technical attributes include alignment, overlay and throughput. In this work, we review progress on pattern capab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9046ad6f790aca4c53fbb24eb296133
https://doi.org/10.1109/edtm47692.2020.9117892
https://doi.org/10.1109/edtm47692.2020.9117892