Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Keisuke Tsudaka"'
Publikováno v:
Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e6aba334c8b1e16fd88ad09bf31455d
https://doi.org/10.1109/imnc.1998.729963
https://doi.org/10.1109/imnc.1998.729963
Autor:
Keisuke Tsudaka, Mikio Katsumata, Akihiro Ogura, Hiroichi Kawahira, Manabu Tomita, Satoru Nozawa
Publikováno v:
SPIE Proceedings.
A feasibility of optical proximity effect correction (OPC) mask manufacturing with a state of the art mask fabrication processing and systems is demonstrated focusing on the 0.25 μm devices and 4X reticle generation. For realistic OPC mask fabricati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::277dc4dd536124f49e85c9abd905512c
https://doi.org/10.1117/12.245218
https://doi.org/10.1117/12.245218
Autor:
Kiichi Ishikawa, Satoru Nozawa, Hiroichi Kawahira, Keisuke Tsudaka, Minoru Sugawara, Ichiro Kagami
Publikováno v:
SPIE Proceedings.
Recently, attenuated phase-shifting masks (att-PSMs) with advanced illumination technology of a modified beam illumination (MBI) become a pioneer to expand applications of i-line and KrF lithography. This technology can enhance a depth of focus even
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d6077f497d5bfcae399127ff91fd51f9
https://doi.org/10.1117/12.228198
https://doi.org/10.1117/12.228198
Publikováno v:
SPIE Proceedings.
A fast resist image estimation methodology using light intensity distribution is proposed. Recently, some optical proximity effect correction (OPC) methods have been developed. Conventionally, to apply light intensity simulation of OPC, resist image
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::038f22c30f7fce29acf42e9c2213adea
https://doi.org/10.1117/12.212804
https://doi.org/10.1117/12.212804
Publikováno v:
Photomask and X-Ray Mask Technology.
EDM (Exposure-Defocus and Mask fabrication latitude) methodology has been established in order to evaluate the practical and reliable process latitudes. A parameter of mask linewidth is newly introduced in the EDM methodology as well as the conventio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8314af119deb2a0ea060da9715cbea9e
https://doi.org/10.1117/12.191933
https://doi.org/10.1117/12.191933
Autor:
Takehiko Gunji, Keisuke Tsudaka, Akihiro Ogura, Hiroichi Kawahira, Satoru Nozawa, Minoru Sugawara
Publikováno v:
Photomask and X-Ray Mask Technology.
A practical attenuated phase-shifting mask (att-PSM) for 0.3 micrometers contact hole patterns with KrF excimer laser lithography has been developed by means of three important module processes which are supported by the precise process latitude eval
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29486c3055061a73ddfdb3bb22d935ac
https://doi.org/10.1117/12.191939
https://doi.org/10.1117/12.191939
Autor:
Minoru Sugawara, Keisuke Tsudaka, Hiroichi Kawahira, Hideo Shimizu, Akihiro Ogura, Fumikatsu Uesawa, Satoru Nozawa
Publikováno v:
SPIE Proceedings.
The performance and practical fabrication latitude of attenuated phase shifting masks have been studied using a newly developed exposure-defocus and mask fabrication latitude (EDM) methodology in which the mask linewidth latitude is taken into accoun
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e24955c96c937775f0cb58a9519995a
https://doi.org/10.1117/12.175416
https://doi.org/10.1117/12.175416
Publikováno v:
Japanese Journal of Applied Physics. 37:6686
We have developed an optical proximity effect correction (OPC) flow for both, the repetitive memory cell patterns by a simulation-based method and for the random logic application specific IC (ASIC) patterns by a rule-based method. Application result
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::046ad911d1bf082344818159b598ecd9
https://doi.org/10.1143/jjap.37.6686
https://doi.org/10.1143/jjap.37.6686
Publikováno v:
Japanese Journal of Applied Physics. 36:7477
A new optical proximity effect correction (OPC) method adaptive for device fabrication has been developed, focusing on the evaluation method of printed images through simulation. The evaluation procedure of this method is consist of not only measurem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e86777c6d7265ac97517bacc8e5d9d58
https://doi.org/10.1143/jjap.36.7477
https://doi.org/10.1143/jjap.36.7477
Autor:
Kiichi Ishikawa, Minoru Sugawara, Hideo Shimizu, Satoru Nozawa, Hiroichi Kawahira, Ichiro Kagami, Tohru Ogawa, Keisuke Tsudaka
Publikováno v:
Japanese Journal of Applied Physics. 34:6590
A new simulation-based approach for specifying an attenuated phase-shifting mask (att-PSM) is proposed with systematically evaluating entire process parameters related to illumination sources, resist development in a wafer and process latitude. Expos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1feefb3f51dc59a21a28fc1d8c3ffb8
https://doi.org/10.1143/jjap.34.6590
https://doi.org/10.1143/jjap.34.6590