Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Keisuke Namba"'
Autor:
Shinjirou Yokota, Keisuke Namba, Noriaki K. Sato, Keiichiro Imura, Hitoshi Yamaoka, Takuma Kawai, Kazuhiko Deguchi, Nozomu Hiraoka, Shinnosuke Hirokawa, Jun'ichiro Mizuki, Yoshiya Yamamoto, Kazushi Sakamoto, Tsutomu Ishimasa, Hirofumi Ishii
Publikováno v:
Scientific Reports, Vol 10, Iss 1, Pp 1-10 (2020)
Scientific Reports
Scientific Reports
Non-Fermi-liquid (NFL), a significant deviation from Fermi-liquid theory, usually emerges near an order-disorder phase transition at absolute zero. Recently, a diverging susceptibility toward zero temperature was observed in a quasicrystal (QC). Sinc
Publikováno v:
Applied Surface Science. 91:227-233
The present paper describes the activation energy for electromigration damage (EMD) of the Cu multilayer interconnection. The Cu multilayer (TiWN/Cu/TiWN) interconnections (width ∼ 0.7 μm) were fabricated by the Ar-sputtering method. The electromi
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:1071-1079
Atomic chlorine concentrations in Cl2 plasmas have been measured by two‐photon laser‐induced fluorescence (LIF). Experiments were performed over a wide pressure range in rf, rf magnetron, and microwave electron cyclotron resonance (ECR) discharge
Publikováno v:
The Proceedings of JSME annual Conference on Robotics and Mechatronics (Robomec). 2015:2P1-B10_1
Publikováno v:
Japanese Journal of Applied Physics. 34:3731
In situ Fourier transform infrared (FTIR) absorption spectroscopy has been used to detect reaction products resulting from the etching of Si in Cl2 plasmas. Silicon tetrachloride SiCl4 was the only gas-phase product species detected during etching. U
Publikováno v:
Japanese Journal of Applied Physics. 33:4276
Ion trajectories near a submicron-patterned surface were investigated using numerical simulations including the effects of local charging on the patterned surface and ion drift velocity toward the wafer. The simulation results were also discussed rel
Publikováno v:
Japanese Journal of Applied Physics. 33:4424
Electron cyclotron resonance (ECR) plasma etching of Si in Cl2 has been studied from the viewpoint of plasma chemistry. Experiments were performed over a wide pressure range (0.2–10 mTorr), using a divergent magnetic-field ECR plasma reactor suppli
Publikováno v:
Japanese Journal of Applied Physics. 33:1530
A new-type electron-cyclotron-resonance (ECR) plasma source has been developed for materials processing. The reactor employed magnetic multicusp fields and microwaves radially injected through an annular slit; this configuration yielded stable, unifo
Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas
Publikováno v:
Japanese Journal of Applied Physics. 32:6102
The properties of platinum etching were investigated using both rf magnetron and electron cyclotron resonance plasmas, together with measurement of the plasma parameters. Experiments were performed over a wide pressure range from 0.4 to 50 mTorr in C
Publikováno v:
JAPAN TAPPI JOURNAL. 40:568-574
Ozone bleaching of kraft pulp has been investigated for the purpose of developing oxygenbased pulp bleaching process as an alternative to chlorine-containing one which produces unfavourable products. In this paper, liquid phase ozone bleaching has be