Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Keigo Maejima"'
Autor:
Michio Kondo, Hirotaka Katayama, Takuya Matsui, Takashi Koida, Yoshiaki Takeuchi, Isao Yoshida, Hitoshi Sai, Koji Matsubara, Shuichiro Sugiyama, Keigo Maejima
Publikováno v:
IEEE Journal of Photovoltaics. 5:1528-1533
Power conversion efficiency of thin-film microcrystalline silicon solar cells has been remarkably improved recently: from 10.1% to 11.8%. Front transparent conductive oxide (TCO) films have played an important role in this efficiency improvement. In
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4a6bf1cfe333b57bd9720c6344cbda1
https://doi.org/10.1109/jphotov.2015.2478030
https://doi.org/10.1109/jphotov.2015.2478030
Autor:
Hajime SHIBATA, Keigo MAEJIMA, Koji MATSUBARA, Hitoshi TAMPO, Akimasa YAMADA, Shogo ISHIZUKA, Shigeru NIKI
Publikováno v:
Journal of The Surface Finishing Society of Japan. 60:636-640
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::68ff735f574fcc96721c36c33111bcb3
https://doi.org/10.4139/sfj.60.636
https://doi.org/10.4139/sfj.60.636
Autor:
Shuichiro Sugiyama, Takuya Matsui, Koji Matsubara, Yoshiaki Takeuchi, Michio Kondo, Isao Yoshida, Keigo Maejima, Hirotaka Katayama, Takashi Koida, Hitoshi Sai
Publikováno v:
2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC).
In the recent 3 years, power conversion efficiencies in thin-film microcrystalline silicon solar cells were remarkably improved from 10.1% to 11.8%. Front transparent conductive oxide films play an important role in this efficiency improvement. In th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::501c0a6b78bc9976cfad88ef5985cbe9
https://doi.org/10.1109/pvsc.2015.7355677
https://doi.org/10.1109/pvsc.2015.7355677
Autor:
Hirotaka Katayama, Michio Kondo, Hitoshi Sai, Keigo Maejima, Sachiko Nakao, Takashi Koida, Takuya Matsui, Yoshiaki Takeuchi, Isao Yoshida
Publikováno v:
Japanese Journal of Applied Physics. 54:08KB05
The potential of high-rate growth of high-quality microcrystalline silicon (µc-Si:H) films for solar cell applications is investigated by very high frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) under a high-pressure SiH4 depletion
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da780ffa7722f39d5300288326c832a0
https://doi.org/10.7567/jjap.54.08kb05
https://doi.org/10.7567/jjap.54.08kb05
Autor:
Hitoshi Sai, Keigo Maejima, Takuya Matsui, Takashi Koida, Michio Kondo, Sachiko Nakao, Yoshiaki Takeuchi, Hirotaka Katayama, Isao Yoshida
Publikováno v:
Japanese Journal of Applied Physics; Aug2015, Vol. 54 Issue 8S1, p1-1, 1p