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Publikováno v:
Proceedings of the 2016 International Conference on Innovative Material Science and Technology (IMST 2016).
Publikováno v:
Applied Mechanics and Materials. :707-714
In the paper, an approach for introducing a photoacid generator (PAG) into Langmuir- Blodgett (LB) films to draw photopatterns is described. The chemically amplified positive-tone resist system used here consisted of two components: a copolymer, poly
Publikováno v:
Advanced Materials, Technology & Application - Proceedings of the 2016 International Conference (Amta2016); 2016, p195-202, 8p