Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Kazuyuki Usuki"'
Autor:
Kazuyuki Usuki, Yuichirou Goto
Publikováno v:
Journal of Photopolymer Science and Technology. 29:169-177
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e840da2309a675f06dded0aa019c4d4
https://doi.org/10.2494/photopolymer.29.169
https://doi.org/10.2494/photopolymer.29.169
Autor:
Tadashi Oomatsu, Kunihiko Kodama, Shinji Tarutani, Akiko Hattori, Kouji Shitabatake, Satoshi Wakamatsu, Kazuyuki Usuki, Hideto Tanabe
Publikováno v:
Alternative Lithographic Technologies IV.
Design considerations for UV-NIL resists were investigated focusing on the major issues of ink-jetting performance, pattern formability, release property, and dry etching resistance. Regarding ink-jetting performance, small droplet inkjetting of 0.7p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49a734383dd51645a7f96f08768026b9
https://doi.org/10.1117/12.915812
https://doi.org/10.1117/12.915812
Autor:
Kazuyuki Usuki, Naotoshi Sato, Tadashi Oomatsu, Kunihiko Kodama, Satoshi Wakamatsu, Toshihiro Usa, Katsuhiro Nishimaki
Publikováno v:
SPIE Proceedings.
We have been developing nanoimprint templates for the next-generation sub-20nm nanofabrication technology, with particular emphasis on duplicate fabrication of quartz templates created from Si masters. In general, the narrowing of pattern line widths
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c3928bd413859c0eb7f5ae7a1baa4d3
https://doi.org/10.1117/12.896504
https://doi.org/10.1117/12.896504
Publikováno v:
Alternative Lithographic Technologies III.
Reduction of resist filling time was investigated with the aim of improving UV-nanoimprint lithography (UV-NIL) throughput. A novel low volatility, low viscosity resist was developed to enable ink-jetting with minute resist droplets and imprinting un
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d84c198dcab3bf76af4f0db148a78b28
https://doi.org/10.1117/12.879200
https://doi.org/10.1117/12.879200
Autor:
Kenji Saitou, Tadashi Oomatsu, Noriko Yamashita, Toshihide Ishioka, Kazuyuki Usuki, Takashi Katou, Atsushi Tatsugawa
Publikováno v:
SPIE Proceedings.
Duplicated templates from a patterned silicon master were studied. The pattern was fabricated on a silicon wafer by rotary electron beam (EB) writer and reactive ion etching (RIE). 2.5-inch full surface discrete track media (DTM) templates of TP70nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6f065e916fe6c7d2d9dfecff41f1d78
https://doi.org/10.1117/12.864192
https://doi.org/10.1117/12.864192
Publikováno v:
Journal of Materials Science. 27:3879-3882
Metal nitrides and carbides powders were synthesized by the spark discharge method in liquid ammonia at 100 °C and 11 kV of the spark discharge voltage and in n-heptane at 25 °C and 7.5 kV using the pellets of aluminum, titanium, iron and chromium
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::007a1ea335405c3ab0d5fb772add78ff
https://doi.org/10.1007/bf00545471
https://doi.org/10.1007/bf00545471
Autor:
Kazuyuki Usuki, Noriko Yamashita, Tadashi Oomatsu, Satoshi Wakamatsu, Katsuhiro Nishimaki, Toshihiro Usa
Publikováno v:
SPIE Proceedings.
The Nano Imprint Lithography (NIL) process has been proposed as a method of making Discrete Track Media (DTM) for the next generation hard disc. The UV-NIL process is especially practical because of its minimal thermal expansion and high manufacturin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::910abd6f1b9456a5f3c9235a7eb02437
https://doi.org/10.1117/12.833466
https://doi.org/10.1117/12.833466
Publikováno v:
NIPPON KAGAKU KAISHI. :1432-1437
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f835f58d1385df99bc51dafd74f8d3e
https://doi.org/10.1246/nikkashi.1991.1432
https://doi.org/10.1246/nikkashi.1991.1432
Publikováno v:
NIPPON KAGAKU KAISHI. :627-629
In order to obtain pure EuN powder, sponge Eu was prepared by evacuation of NH3 under 10-s Torr from an Eu solution of liquid NH3 a part of impurities in which was removed by dissolution of Eu. The resulting sponge Eu contained 2-3% of Eu(NH2)2 and a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41f242374ffca0c278be63fcd46dd80d
https://doi.org/10.1246/nikkashi.1993.627
https://doi.org/10.1246/nikkashi.1993.627
Autor:
Kouji Shitabatake, Satoshi Wakamatsu, Kazuyuki Usuki, Akiko Hattori, Shinji Tarutani, Hideto Tanabe, Kunihiko Kodama, Tadashi Oomatsu
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 11:033008
Design considerations for ultraviolet-nanoimprint lithography resists were investigated focusing on the major issues of ink-jetting performance, pattern formability, release property, and dry etching resistance. Regarding ink-jetting performance, sma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a0e3b54dae1ed49a2dcd8b9885329d2
https://doi.org/10.1117/1.jmm.11.3.033008
https://doi.org/10.1117/1.jmm.11.3.033008