Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Kazuya Kadota"'
Autor:
Kazuya Kadota
Publikováno v:
SPIE Proceedings.
Design For Manufacturing (DFM) where the state-of-the-art nano-devices of the sub-20nm node to a subject, for each of the technology has been intricately sophisticated, comprehensive optimization to predict the performance of the device came become v
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b48b6b313b696cdd2123f76b9812f16
https://doi.org/10.1117/12.2240392
https://doi.org/10.1117/12.2240392
Publikováno v:
SPIE Proceedings.
GPGPU (General Purpose Graphic Processor Unit) has been attracting many engineers and scientists who develop their own software for massive numerical computation. With hundreds of core-processors and tens of thousands of threads operating concurrentl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77af1fca59a7d0063a5cb47333e3fd7e
https://doi.org/10.1117/12.970255
https://doi.org/10.1117/12.970255
Autor:
Takashi Sato, Michio Honma, Hiroyuki Itoh, Nobuyuki Iriki, Sachiko Kobayashi, Norihiko Miyazaki, Toshio Onodera, Hiroyuki Suzuki, Nobuyuki Yoshioka, Sumika Arima, Kazuya Kadota
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cdc08672d2f0547d9186691f019bda2e
https://doi.org/10.1117/12.824354
https://doi.org/10.1117/12.824354
Publikováno v:
The Proceedings of the Dynamics & Design Conference. 2008:332-1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e8aef69ebb30361386e0d0ed59c4641
https://doi.org/10.1299/jsmedmc.2008._332-1_
https://doi.org/10.1299/jsmedmc.2008._332-1_
Autor:
Kazuya Kadota, Sadao Okano, Masayasu Tsunematsu, Kazuyuki Suko, Masahiro Nozaki, Sugimoto Aritoshi, Takeshi Kato, Tetsuo Ito
Publikováno v:
Optical/Laser Microlithography III.
New indexes to evaluate and simulate the resolution power of the UV resists based on the dissolution rate curve as it relates to local inhibitor concentration are proposed. Optical parameters and the dissolution rate curve of commercially available r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac4b11675dd3d11a3dcd44d386194c50
https://doi.org/10.1117/12.20218
https://doi.org/10.1117/12.20218
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9:2792
The photoactive and development parameters of commercially available g‐line photoresists which are TOKs OFPR800, OFPR5000, TSMR8900, and TSMR‐V3, were measured. From the simulated and experimental linewidth linearity data, it was found that the p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::84916929c1d9846be7792a39a8e45d7f
https://doi.org/10.1116/1.585646
https://doi.org/10.1116/1.585646
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8:1080
A three‐dimensional (3D) photolithography simulator was developed which is composed of the two‐dimensional (2D) mask aerial image simulator, simulator for 2D intensity pattern in aligner (STIPAL), and the 3D resist image simulator, resist process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e7b85040ea614188d742bfb7723b7b8
https://doi.org/10.1116/1.584920
https://doi.org/10.1116/1.584920
Autor:
Nonmember Toshiharu Matsuzawa, Member Tetsuo Itoh, Nonmembers Shuichi Hanashima, Kazuya Kadota
Publikováno v:
Electronics and Communications in Japan (Part II: Electronics). 71:41-49
A three-dimensional photoresist shape simulator has been developed for the submicron process. Using this simulator, it is possible to analyze and optimize the photoresist process using an arbitrary projector, photoresist, and developer. In this techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0d06f27d374bb36b0394862964c6b93
https://doi.org/10.1002/ecjb.4420710105
https://doi.org/10.1002/ecjb.4420710105
Publikováno v:
Journal of the Ceramic Association, Japan. 80:179-187
無機高分子物質の多くは, 分子構造にもとづく物性が有機高分子と無機ガラスの中間に位置する. その代表的なものとしてNa2O-P2O5系ガラスを選び, ガラス転移温度付近における応力緩和現
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be80ec9d4684e29bf6e727fa4b8cccdf
https://doi.org/10.2109/jcersj1950.80.921_179
https://doi.org/10.2109/jcersj1950.80.921_179
Publikováno v:
Journal of the Ceramic Association, Japan. 80:7-16
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96d248cc14dceb58248fc6219546b3a2
https://doi.org/10.2109/jcersj1950.80.7
https://doi.org/10.2109/jcersj1950.80.7