Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Kazutoshi Takenoshita"'
Autor:
Ken Kakiyama, Kazutoshi Takenoshita, Shinichi Namba, Yuya Katada, Singo Ikeno, Hideo Nojima, Shota Murakami
Publikováno v:
Engineering Journal, Vol 17, Iss 5 (2013)
Reactive species created by a microhollow cathode discharge (MHCD) in He+H2O mixtures were investigated at 160 Torr using the molecular beam mass spectrometry. Ion currents of He+, HeH+, O+, OH+, H+(H2O), and H+(H2O)2 were measured as functions of H2
Autor:
Simi George, Moza M. Al-Rabban, Vivek Bakshi, Martin Richardson, Chiew-seng Koay, C. Keyser, Kazutoshi Takenoshita
The development of a source bright enough for EUVL, possessing the required long-term stability within a reasonable cost, is forcing plasma physicists to address issues associated with dense plasmas that have up until now received scant attention. Wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17244bc0c8a10335efb1e5edc84555fd
https://doi.org/10.1117/3.613774.ch26
https://doi.org/10.1117/3.613774.ch26
Publikováno v:
Optics express. 15(25)
A comprehensive study of the spectral and Mo-Si mirror inband EUV emission from tin-doped droplet laser plasma targets irradiated with a single 1064 nm beam from an Yb:doped fiber laser is reported.With pre-pulse enhancement, in-band conversion effic
Autor:
Martin Richardson, Robert Bernath, Simi George, Reuvani D. Kamtaprasad, Kazutoshi Takenoshita
Publikováno v:
Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing.
Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser plasmas were completed using a combination of spectroscopic instruments that allow for quantitative spectroscopy throughout the radiation region of 5-5
Autor:
J. Cunado, Christopher G. Brown, Tobias Schmid, Simi George, J. Duncan, Robert Bernath, Kazutoshi Takenoshita, Martin Richardson
Publikováno v:
LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings.
A stabilized targeting scheme is installed in the EUV light source facility and performs high level of stability of tin-doped droplet target positioning for a long term, which is required for the EUVL sources.
Autor:
N. Hay, Tobias Schmid, S. Ellwi, Kazutoshi Takenoshita, Martin Richardson, I. Hendarson, Simi George, J. Cunado, B. Fulford
Publikováno v:
2007 Quantum Electronics and Laser Science Conference.
High EUV source power has been demonstrated with a laser-plasma source exhibiting low debris and high conversion efficiency. This offers a viable path towards successful realization of EUV lithography for the next generation semiconductor devices.
Autor:
Robert Bernath, William T. Silfvast, Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Gregory M. Shimkaveg, Martin Richardson
Publikováno v:
Optics letters. 32(8)
Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium planar solid targets were completed. At 13.5 nm, the best conversion efficiency (CE) for lithium was found to be 2.2% at intensities near 7 x 10(10) W/cm(2
Autor:
Moza M. Al-Rabban, Chiew-Seng Koay, Kazutoshi Takenoshita, J. Cunado, Tobias Schmid, Christopher G. Brown, William T. Silfvast, Martin Richardson, Simi George, Robert Bernath
Publikováno v:
SPIE Proceedings.
Tin-doped droplet target has been integrated with several lasers including high power high repetition rate lasers and demonstrated high conversion efficiencies for all the lasers. This implies the EUV source power is linearly increasing as the laser
Publikováno v:
SPIE Proceedings.
Tin is one of the most efficient source materials for both gas discharge plasma sources and laser produced plasma sources for EUV lithography. Unlike Xenon which was the material commonly investigated for the EUVL source application, recycling of the
Autor:
Christopher G. Brown, Chiew-Seng Koay, Robert Bernath, Martin Richardson, Somsak Teerawattanasook, Kazutoshi Takenoshita, Simi George, J. Cunado, Tobias Schmid
Publikováno v:
SPIE Proceedings.
In this work we present the status of our high repetition-rate/high power EUV source facility. The masslimited target concept has demonstrated high conversion efficiencies (CE) previously, with precision solid state lasers. Currently, experiments are