Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Kazutomo Osari"'
Autor:
Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Ken-ichi Machinaga, Jun Taniguchi
Publikováno v:
Microelectronic Engineering. 87:918-921
Ultra violet nanoimprint lithography (UV-NIL), which is able to obtain the nano-scale pattern effectively and quickly, is strongly desired for the next-generation lithography technology. However, it is well known that the higher viscosity UV-curable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::284346c329fe54dd5ee476d5c3e1e088
https://doi.org/10.1016/j.mee.2009.11.175
https://doi.org/10.1016/j.mee.2009.11.175
Publikováno v:
Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21. :619-622
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d61de705b61159546d9a74745f1fbb7
https://doi.org/10.1299/jsmelem.2009.5.619
https://doi.org/10.1299/jsmelem.2009.5.619
Autor:
Ken ichi Machinaga, Kazutomo Osari, Nobuji Sakai, Noriyuki Unno, Takeshi Ohsaki, Jun Taniguchi
Publikováno v:
Journal of Photopolymer Science and Technology. 22:161-166
Next-generation fine patterning requires a high throughput cost-effective process for the mass producing of various devices, which has a nanometer-scale pattern over a large area. UV nanoimprint lithography (UV-NIL) is a major breakthrough in this fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96ef50aa9deddd469cdb9d961e112aa0
https://doi.org/10.2494/photopolymer.22.161
https://doi.org/10.2494/photopolymer.22.161