Zobrazeno 1 - 10
of 32
pro vyhledávání: '"Kazuo Nate"'
Publikováno v:
Journal of Applied Polymer Science. 44:1583-1590
A new alkali-developable organosilicon positive photoresist (OSPR–1334) and a bilayer resist process with OSPR–1334 has been developed. OSPR–1334 is composed of poly(p-hydroxybenzylsilsesquioxane) and naphthoquinone diazide. The sensitivity and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::73b53dbbe43501da3eb60ac53020aaca
https://doi.org/10.1002/app.1992.070440910
https://doi.org/10.1002/app.1992.070440910
Study on organosilicon positive resist. III. Organosilicon positive excimer laser resist (OSPR-2016)
Publikováno v:
Journal of Applied Polymer Science. 44:1591-1594
A new alkali-developable organosilicon positive excimer laser (KrF) resist (OSPR-2016) has been developed for a bilayer resist system. OSPR-2016 is composed of poly (p-hydroxybenzylsilsesquioxane) and methyl cholate-tris (α-diazoacetoacetate). The r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::588cb35007f3a4f56d01b196fa30a779
https://doi.org/10.1002/app.1992.070440911
https://doi.org/10.1002/app.1992.070440911
Publikováno v:
Journal of Applied Polymer Science. 44:1573-1582
Silsesquioxane, siloxane, and silmethylene polymers with phenolic hydroxy groups were prepared in order to obtain alkali-soluble organosilicon polymers. These polymers have structures in which the phenol moieties are separated by one carbon from the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a5bb5883f3d71cefa069207ca72e72b
https://doi.org/10.1002/app.1992.070440909
https://doi.org/10.1002/app.1992.070440909
Publikováno v:
Advances in Resist Technology and Processing VIII.
A bi-layer resist system utilizing an alkali-developable organosilicon positive photoresist (OSPR) has been developed. The composite prepared from an alkali-soluble organosilicon polymer, poly(p- hydroxybenzylsilsesquioxane) and naphthoquinone diazid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7065759864b469cc9dfaa559c55d6c29
https://doi.org/10.1117/12.46371
https://doi.org/10.1117/12.46371
Publikováno v:
Journal of Polymer Science: Polymer Letters Edition. 21:373-380
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a20eec171adcb2f7cd650f14bf1afc0c
https://doi.org/10.1002/pol.1983.130210510
https://doi.org/10.1002/pol.1983.130210510
Publikováno v:
Makromolekulare Chemie. Macromolecular Symposia. 24:189-199
Two new families of photosensitive organo-silicon polymers are described. One is based on the Si-Si σ-bond photochemistry and another is based on the combinations of new alkaline-soluble organosilicon polymers with diazoquinone photosensitizers. Bot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa5c74bf7de800f98e104fb25f59eed0
https://doi.org/10.1002/masy.19890240119
https://doi.org/10.1002/masy.19890240119
Publikováno v:
Die Makromolekulare Chemie. 186:1543-1548
Photochemical and radical polymerization of 2-methylene-4-phenyl-1,3-dioxolane (1) were carried out leading to the same polyester 2. By radical copolymerization of 1 with methyl methacrylate using various mole ratios of the monomers, the correspondin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ffb40caf84d16e9e09c217e74826e520
https://doi.org/10.1002/macp.1985.021860802
https://doi.org/10.1002/macp.1985.021860802
Publikováno v:
Journal of Applied Polymer Science. 34:2445-2455
A new class of positive deep ultravoilet (UV) resists consisting of poly(p-disilanylenephenylene)s was developed, in which a disilanylene unit and a phenylene unit are connected alternatively in the polymer main chain. These resists had very high etc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4717f806b67cf3021c5f01a328b6a23
https://doi.org/10.1002/app.1987.070340709
https://doi.org/10.1002/app.1987.070340709
Publikováno v:
Journal of Applied Polymer Science. 35:913-921
Copolymers of aliphatic aldehydes containing a trimethylsilyl group were prepared at −78°C in toluene using diethylaluminum diphenylamide as an initiator. The copolymer depolymerized into monomeric aldehydes on exposure to soft X-rays. When the co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f704f80394483a1efde8fba9508e7daf
https://doi.org/10.1002/app.1988.070350407
https://doi.org/10.1002/app.1988.070350407
Kinetics of the Autoxidation of Substituted Anthranols to Anthraquinones in Buffered Aqueous Dioxane
Publikováno v:
Bulletin of the Chemical Society of Japan. 47:174-178
Autoxidation of 2-substituted anthranols to the corresponding anthraquinones in alkaline buffered aqueous dioxane (2:1 in vol) has been studied kinetically at 35 °C by means of the manometric method. The relative rate constants for the autoxidation
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f56878949488e06f81e5b2510d9ed116
https://doi.org/10.1246/bcsj.47.174
https://doi.org/10.1246/bcsj.47.174