Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Kazuo Kinose"'
Autor:
Atsushi Tanide, Shohei Nakamura, Akira Horikoshi, Shigeru Takatsuji, Takahiro Kimura, Kazuo Kinose, Soichi Nadahara, Masazumi Nishikawa, Akinori Ebe, Kenji Ishikawa, Osamu Oda, Masaru Hori
Publikováno v:
ACS Omega, Vol 5, Iss 41, Pp 26776-26785 (2020)
Externí odkaz:
https://doaj.org/article/245b6caa49c940b58b51a3d5470b652a
Autor:
Osamu Oda, Takahiro Kimura, Kazuo Kinose, Shigeru Takatsuji, Masaru Hori, Soichi Nadahara, Akira Horikoshi, Masazumi Nishikawa, Kenji Ishikawa, Akinori Ebe, Atsushi Tanide, Shohei Nakamura
Publikováno v:
ACS Omega, Vol 5, Iss 41, Pp 26776-26785 (2020)
ACS Omega
ACS Omega
The growth of sputtered GaN at low temperature is strongly desired to realize the dissemination of low-cost GaN high electron mobility transistor devices for next-generation communication technology. In this work, the roles of atomic nitrogen (N)/hyd
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9c35ada60a7ba84b749d4b3bb37526c8
https://doaj.org/article/245b6caa49c940b58b51a3d5470b652a
https://doaj.org/article/245b6caa49c940b58b51a3d5470b652a
Autor:
Shigeru Takatsuji, Makoto Sekine, Akira Horikoshi, Shohei Nakamura, Masaru Hori, Soichi Nadahara, Motohiro Kohno, Kazuo Kinose, Kenji Ishikawa, Atsushi Tanide
Publikováno v:
Journal of Vacuum Science & Technology B. 37:021209
Gallium nitride films were etched at 400 °C and 20 Pa with a radio-frequency-generated Cl2–BCl3 mixed plasma. While dog-legged profiles were obtained by plasma etching using pure Cl2, straight sidewall shapes were achieved through BCl3 gas additio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d17acbda4d6525222f5b5a5ca2d71639
https://doi.org/10.1116/1.5082345
https://doi.org/10.1116/1.5082345
Autor:
Soichi Nadahara, Masazumi Nishikawa, Shigeru Takatsuji, Akira Horikoshi, Motohiro Kohno, Akinori Ebe, Kazuo Kinose, Masaru Hori, Shohei Nakamura, Atsushi Tanide, Kenji Ishikawa
Publikováno v:
Japanese Journal of Applied Physics. 58:SAAF04
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f33c3ad28acfc168d95be20204831889
https://doi.org/10.7567/1347-4065/aaeb39
https://doi.org/10.7567/1347-4065/aaeb39
Publikováno v:
SID Symposium Digest of Technical Papers. 37:1774
A method to detect mura on a coated photoresist layer in the manufacturing line of display devices is reported. The mura is irregular nonuniformity of transmittance or reflectance on a uniformly manufactured surface. The display devices are manufactu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b79ca73243c700824fa213b9124131e
https://doi.org/10.1889/1.2433381
https://doi.org/10.1889/1.2433381
Autor:
Atsushi Tanide, Shohei Nakamura, Akira Horikoshi, Shigeru Takatsuji, Motohiro Kohno, Kazuo Kinose, Soichi Nadahara, Masazumi Nishikawa, Akinori Ebe, Kenji Ishikawa, Masaru Hori
Publikováno v:
Japanese Journal of Applied Physics; Feb2019, Vol. 58 Issue SA, p1-1, 1p