Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Kazunori Omata"'
Autor:
Tomoya Tamura, Seh-Jin Park, Guojing Zhang, Yuta Sato, Kazunori Omata, Hal Kusunose, Andy Ma, Ted Liang
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL) is a leading technology to succeed optical lithography for high volume production of 22 nm node and beyond. One of the top risks for EUVL is the readiness of defect-free masks, especially the availability of Mo/
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d330c7053d011448a51c4e32268c36f7
https://doi.org/10.1117/12.824259
https://doi.org/10.1117/12.824259
