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of 31
pro vyhledávání: '"Kazuaki Hotta"'
Autor:
Kazuaki Hotta
Publikováno v:
The Journal of The Institute of Electrical Engineers of Japan. 128:672-675
Publikováno v:
Japanese Journal of Applied Physics. 42:4325-4329
An ultra-line-narrowed, ultra-high-repetition-rate, high-power injection locked F2 laser system for 157 nm exposure tools has been developed. The laser system consists of a low-power oscillator laser having an ultra-narrow spectral bandwidth and a hi
Autor:
Masayuki Konishi, Hidenori Watanabe, Yoshifumi Ueno, Takahito Kumazaki, Ryoichi Nohdomi, Toshio Yamashita, Masaki Nakano, Kazuaki Hotta, Kotaro Sasano, Tatsuya Ariga, Takashi Suganuma, Kiyoharu Nakao, Naoki Kitatochi, Hakaru Mizoguchi, Toshihiro Nishisaka
Publikováno v:
Journal of Photopolymer Science and Technology. 15:577-582
The roadmap of semiconductor fabrication predicts that the semiconductor market will demand 65nm node devices from 2004/2005. Therefore, an Ultra-Line-Narrowed F2 laser for dioptric projection systems is currently being developed under the ASET proje
Autor:
Kazuaki Hotta
Publikováno v:
The Review of Laser Engineering. 29:638-644
EUV (Extreme Ultra-Violet) lithography is most promising technology after 50 nm technology node fromaround 2007. There are many problems in order to realize EUV lithography and the most serious problem is todevelop the EUV source. A debris free EUV s
Publikováno v:
SPIE Proceedings.
Debris-mitigation tools (DMTs) have been used in DPP sources and the performance has been well proven in alpha sources. In beta and HVM sources, requirement to the DMT is increasing to fulfill the power and lifetime requirements simultaneously. In or
Publikováno v:
SPIE Proceedings.
A laser-triggered DPP source is being developed and showing considerable progress toward HVM. Performance, in terms of power and lifetime, of DPP sources has been proven by long-term usage in lithography development fields. Since high-performance deb
Publikováno v:
The Review of Laser Engineering. 21:1021-1030
Discharge excited rare-gas halide excimer lasers are useful for material processing such as lithography for next generation LSl, laser ablation of polymers and annealing for Si TAT. Among rare-gas halide excimer lasers, three lasers, XeCl, KrF and Ar
Autor:
Kazuaki Hotta
Publikováno v:
THE JOURNAL OF JAPAN SOCIETY FOR LASER SURGERY AND MEDICINE. 13:203-206
Publikováno v:
Alternative Lithographic Technologies.
Two projects are being conducted in EUVA under the support of NEDO and member companies; private project and national project. The private project is responsible for power improvement of a source module targeting realization of 115-W prototype. The n
Autor:
Tomonao Hosokai, Hiroto Sato, Takahiro Shirai, Shinsuke Mouri, Daiki Yamatani, Kiyoyuki Kabuki, Kazuaki Hotta, Yuki Joshima, Takahiro Inoue, Koji Miyauchi, Takuma Yokoyama, Yusuke Teramoto, Toshio Yokota, Gohta Niimi, Hiroshi Mizokoshi, Tetsu Takemura, Kohkan C. Paul, Hironobu Yabuta, Kazunori Bessho, Zenzo Narihiro
Publikováno v:
SPIE Proceedings.
Discharge-produced plasma (DPP)-based EUV source is being developed at Gotenba Branch of EUVA Hiratsuka RDsr within 2 % bandwidth around 13.5 nm. Using a nested grazing-incidence collector, EUV power at the intermediate focus which is defined as an i