Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kawkab D. Salim"'
Autor:
null Kawkab D. Salim, null Hanan Ridha
Publikováno v:
Tikrit Journal of Pure Science. 26:88-93
CdSe thin films were deposited on a glass substrate by using vacuum thermal evaporation technique. The deposited films were annealed to 350˚C for (10, 20, 30) minutes respectively. Structural, morphological, optical and electrical properties of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29610ddb02ee788e63dd33381ad1c819
https://doi.org/10.25130/tjps.v26i2.123
https://doi.org/10.25130/tjps.v26i2.123
Autor:
null Kawkab D. Salim
Publikováno v:
Tikrit Journal of Pure Science. 26:68-70
In this paper, Two main effected parameters on the efficiency of solar cell has studied: the increasing in the amount of intensity of incident solar irradiance on the surface of silicon solar cell and accumulation of dust on the front face of solar c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::928df21d24485023f09f484d5c8ac1aa
https://doi.org/10.25130/tjps.v26i4.164
https://doi.org/10.25130/tjps.v26i4.164
Autor:
Maha H. Khalaf, Kawkab D. Salim
Publikováno v:
Materials Today: Proceedings. 47:6197-6200
In this work, nanostructure cadmium chloride (CdCl2) thin films, were prepared by vacuum thermal evaporation technique on glass substrates at room temperature. The Energy band gap were deduced by UV spectrophotometer and it was 2.25 eV for the pure f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87c992a0941d380add237eef3e7fa9c0
https://doi.org/10.1016/j.matpr.2021.05.159
https://doi.org/10.1016/j.matpr.2021.05.159
Autor:
Hameed M. Abdul Jabbar, Kawkab D. Salim, Ayad Ahmed Salih, Shatha H. Mahdi, Hanan Kadhem, Aliyah A. Shihab, Mohsin A. Hassooni, Inbethaq M. A. Abdulameer
Publikováno v:
AIP Conference Proceedings.
Nano-silica (SiO2) with a different additive of zirconia to form a composite material has a thickness of 1.5mm for all obtained specimens. The effect of nano-silica with different additive rates on the dielectric strength, voltage rise rate and numbe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e2119e0eafc00e8aebec5f71b601bf07
https://doi.org/10.1063/1.5039180
https://doi.org/10.1063/1.5039180