Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Kavitha Devi Buddharaju"'
Autor:
Jayakumar Perumal, Tianxun Gong, Dinish U. S., Kavitha Devi Buddharaju, Patrick Lo Guo-Qiang, Malini Olivo
Publikováno v:
AIP Advances, Vol 7, Iss 5, Pp 055017-055017-7 (2017)
SERS enhancement factor (EF) of planar substrates depends on the size and shape of the fine nanostructure forming a defect free, well-arranged matrix. Nano-lithographic process is considered to be the most advanced methods employed for the fabrica
Externí odkaz:
https://doaj.org/article/31d45ca23cd24d87a4cea694bba889b9
Autor:
Xiang Li, She-Mein Wong, Y. H. Yu, Navab Singh, Yuan Sun, Dim-Lee Kwong, Kavitha Devi Buddharaju, G. Q. Lo, Yisuo Li, Nansheng Shen, G. Ramanathan, S. J. Lee, Zuying Chen
Publikováno v:
Journal of Nanotechnology, Vol 2012 (2012)
This paper reviews the progress of the vertical top-down nanowire technology platform developed to explore novel device architectures and integration schemes for green electronics and clean energy applications. Under electronics domain, besides havin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::76490d4727dcd1743b62c19ea21c63b5
https://doi.org/10.1155/2012/492121
https://doi.org/10.1155/2012/492121
Autor:
N. Balasubramanian, S.C. Rustagi, Navab Singh, Kavitha Devi Buddharaju, Guo-Qiang P. Lo, Dim-Lee Kwong
Publikováno v:
ECS Transactions. 16:729-729
Though top-down approach, which leverages on conventional lithography, patterning for wire formation, has been considered as the closest to the manufacturing format, many technology issues or even barriers are still widely remained. These technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::658352c675c0da10c6bd2fd1ab1d726a
https://doi.org/10.1149/1.2986830
https://doi.org/10.1149/1.2986830