Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Katsuyasu Shiba"'
Autor:
Makoto Usuki, Takashi Nakagawa, Seiichi Omoto, Shota Takita, Tatsuhiko Miura, Katsuyasu Shiba, Tsutomu Sato
Publikováno v:
2018 International Symposium on Semiconductor Manufacturing (ISSM).
The method of improving thickness uniformity of sputter-deposited film by using magnet rotation speed control technique as an advanced process control (APC) is discussed. It is demonstrated that magnet rotation speed control technique can improve bot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ad501cb6af6e58ed491fd53acd1a98d
https://doi.org/10.1109/issm.2018.8651152
https://doi.org/10.1109/issm.2018.8651152
Autor:
Naofumi Nakamura, Yasushi Oikawa, Hideki Shibata, Katsuyasu Shiba, Tomio Katata, Jun–ichi Wada, Minakshisundaran Balasubramanian Anand
Publikováno v:
Japanese Journal of Applied Physics. 37:5526
A fully integrated aluminum dual damascene process is presented. The process incorporates a double silicon nitride etch stopper structure to achieve better etching control. Use of silicon nitride etch stoppers usually results in increased wire capaci
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f5b6142d31db864b0fb6d45da7459e8
https://doi.org/10.1143/jjap.37.5526
https://doi.org/10.1143/jjap.37.5526